SCHEMBL3079516

SCHEMBL3079516

N=C(NC(=N)NC12CCC(CC1)C2)NC12CCC(CC1)C2

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 2/20 0.31
EPHX1 P07099 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3072038 0.91 EPHX2 (0.33) EPHX2EPHX1
SCHEMBL3082855 0.88 SIGMAR1 (0.30)
SCHEMBL3069081 0.77 EPHX2 (0.54) EPHX2EPHX1
SCHEMBL3079023 0.77 EPHX2 (0.43) EPHX2EPHX1
SCHEMBL3082239 0.73 EPHX2 (0.60) EPHX2EPHX1
SCHEMBL3068816 0.73 EPHX2 (0.60) EPHX2EPHX1
SCHEMBL3071718 0.73 EPHX2 (0.43) EPHX2EPHX1
SCHEMBL3064315 0.72 EPHX2 (0.39) EPHX2EPHX1
SCHEMBL1605302 0.71 EPHX2 (0.41) EPHX2EPHX1
SCHEMBL9011407 0.70 EPHX2 (0.40) EPHX2EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12264275-B2 Treatment liquid FUJIFILM CORPORATION (JP) 2025-04-01 US disclosed
EP-3719105-B1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MAT USA INC (US) 2023-09-27 EP disclosed
US-11639487-B2 Cleaning formulation for removing residues on surfaces FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2023-05-02 US disclosed
US-11618867-B2 Cleaning formulation for removing residues on surfaces FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2023-04-04 US disclosed
US-20230101156-A1 TREATMENT LIQUID FUJIFILM CORPORATION (JP) 2023-03-30 US disclosed
US-20230100080-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2023-03-30 US disclosed
US-20230066300-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2023-03-02 US disclosed
US-20220275313-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2022-09-01 US disclosed
US-11401487-B2 Cleaning formulation for removing residues on surfaces FUJIFILM ELECTRONICS MATERIALS U.S.A., INC. (US) 2022-08-02 US disclosed
US-11359169-B2 2022-06-14 US disclosed
EP-1472319-A1 NON-TOXIC CORROSION PROTECTION PIGMENTS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2004-11-03 EP disclosed
WO-2004065305-A1 NON-TOXIC CORROSION-PROTECTION PIGMENTS BASED ON MANGANESE UNIVERSITY OF DAYTON (US) 2004-08-05 WO disclosed
US-20040104377-A1 Non-toxic corrosion-protection pigments based on rare earth elements UNIVERSITY OF DAYTON 2004-06-03 US disclosed
US-20040020568-A1 Non-toxic corrosion-protection conversion coats based on rare earth elements DAYTON, UNIVERSITY OF 2004-02-05 US disclosed
US-20040016363-A1 CORROSION-INHIBITING COATING VENTURE LENDING & LEASING, IV, INC. 2004-01-29 US disclosed
US-20040016910-A1 Non-toxic corrosion-protection rinses and seals based on rare earth elements DAYTON, UNIVERSITY OF 2004-01-29 US disclosed
US-20030230363-A1 Non-toxic corrosion-protection rinses and seals based on cobalt UNIVERSITY OF DAYTON 2003-12-18 US disclosed
WO-2003060192-A1 NON-TOXIC CORROSION-PROTECTION RINSES AND SEALS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
WO-2003060191-A2 NON-TOXIC CORROSION-PROTECTION CONVERSION COATINGES ABSED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
WO-2003060019-A1 NON-TOXIC CORROSION PROTECTION PIGMENTS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed