SCHEMBL3082855

SCHEMBL3082855

N=C(N)NC(=N)NC12CCC(CC1)C2

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3079516 0.88 EPHX2 (0.31)
SCHEMBL3072038 0.84 EPHX2 (0.33)
SCHEMBL3056476 0.81 SIGMAR1 (0.47) SIGMAR1
SCHEMBL3064315 0.75 EPHX2 (0.39) SIGMAR1
SCHEMBL9011407 0.72 EPHX2 (0.40) SIGMAR1
SCHEMBL1605426 0.72 EPHX2 (0.40) SIGMAR1
SCHEMBL3079023 0.71 EPHX2 (0.43) SIGMAR1
SCHEMBL3067250 0.70 EPHX2 (0.44)
SCHEMBL3064369 0.70 EPHX2 (0.44)
SCHEMBL3069016 0.70 EPHX2 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12264275-B2 Treatment liquid FUJIFILM CORPORATION (JP) 2025-04-01 US disclosed
US-20240002725-A1 COMPOSITION AND METHOD FOR TREATING SUBSTRATE FUJIFILM CORPORATION (JP) 2024-01-04 US disclosed
CN-117062940-A Composition and method for treating substrate 富士胶片株式会社 2023-11-14 CN disclosed
EP-3719105-B1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MAT USA INC (US) 2023-09-27 EP disclosed
US-11639487-B2 Cleaning formulation for removing residues on surfaces FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2023-05-02 US disclosed
US-11618867-B2 Cleaning formulation for removing residues on surfaces FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2023-04-04 US disclosed
US-20230100080-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2023-03-30 US disclosed
US-20230101156-A1 TREATMENT LIQUID FUJIFILM CORPORATION (JP) 2023-03-30 US disclosed
CN-115746855-A Treatment liquid 富士胶片株式会社 2023-03-07 CN disclosed
US-20230066300-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2023-03-02 US disclosed
WO-2004065305-A1 NON-TOXIC CORROSION-PROTECTION PIGMENTS BASED ON MANGANESE UNIVERSITY OF DAYTON (US) 2004-08-05 WO disclosed
US-20040104377-A1 Non-toxic corrosion-protection pigments based on rare earth elements UNIVERSITY OF DAYTON 2004-06-03 US disclosed
US-20040020568-A1 Non-toxic corrosion-protection conversion coats based on rare earth elements DAYTON, UNIVERSITY OF 2004-02-05 US disclosed
US-20040016363-A1 CORROSION-INHIBITING COATING VENTURE LENDING & LEASING, IV, INC. 2004-01-29 US disclosed
WO-2004009869-A2 CORROSION-INHIBITING COATING FOR METAL SURFACES UNIVERSITY OF DAYTON (US) 2004-01-29 WO disclosed
US-20040016910-A1 Non-toxic corrosion-protection rinses and seals based on rare earth elements DAYTON, UNIVERSITY OF 2004-01-29 US disclosed
US-20030230363-A1 Non-toxic corrosion-protection rinses and seals based on cobalt UNIVERSITY OF DAYTON 2003-12-18 US disclosed
WO-2003060192-A1 NON-TOXIC CORROSION-PROTECTION RINSES AND SEALS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
WO-2003060191-A2 NON-TOXIC CORROSION-PROTECTION CONVERSION COATINGES ABSED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
WO-2003060019-A1 NON-TOXIC CORROSION PROTECTION PIGMENTS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed