SCHEMBL30801019

SCHEMBL30801019

O=C1CC=C(S(=O)(=O)Cl)c2ccccc21

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
S100A4 P26447 4/20 0.36
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
CDC25B P30305 1/20 0.36
IDO1 P14902 1/20 0.35
DNMT1 P26358 1/20 0.35
DNMT3L Q9UJW3 1/20 0.35
DNMT3A Q9Y6K1 1/20 0.35
ALDH1A1 P00352 1/20 0.35
HSD17B10 Q99714 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CES1 P23141 3/20 0.35
BCHE P06276 2/20 0.35
MAOA P21397 3/20 0.34
POLB P06746 2/20 0.34
APAF1 O14727 2/20 0.34
TDP2 O95551 2/20 0.34
KDM4E B2RXH2 1/20 0.34
CES2 O00748 1/20 0.34
TERT O14746 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16047148 0.71 IDO1 (0.41) S100A4MEN1KMT2ACDC25BIDO1
SCHEMBL29727870 0.71 IDO1 (0.41) S100A4MEN1KMT2ACDC25BIDO1
SCHEMBL30260416 0.71 KEAP1 (0.50) ALDH1A1POLBKDM4ELMNASMN1; SMN2
SCHEMBL28905016 0.69 PTPRC (0.45) S100A4MEN1KMT2ACDC25BIDO1
SCHEMBL9709505 0.68 PTPN1 (0.63) MEN1KMT2ACDC25BIDO1DNMT1
SCHEMBL11759459 0.68 CES1 (0.45) ALDH1A1HSD17B10TDP1CES1BCHE
SCHEMBL10028286 0.67 MAPT (0.43) S100A4MEN1KMT2ACDC25BALDH1A1
SCHEMBL28490476 0.67 CDC25B (0.39) S100A4MEN1KMT2ACDC25BIDO1
SCHEMBL31432533 0.67 PKM (0.44) MEN1KMT2AALDH1A1HSD17B10TDP1
SCHEMBL29137694 0.65 NOTUM (0.41) S100A4MEN1KMT2AALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117866204-B Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-12-13 CN disclosed
CN-117866204-A Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-04-12 CN disclosed
CN-117866205-A Silicon-containing surface modifier and resist underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-04-12 CN disclosed