Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR1 | P21554 | 2/20 | 0.48 |
| ▸ | CNR2 | P34972 | 2/20 | 0.48 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | MAOA | P21397 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | ALOX5 | P09917 | 4/20 | 0.41 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.40 |
| ▸ | TACR1 | P25103 | 2/20 | 0.39 |
| ▸ | MAOB | P27338 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29400404 | 0.87 | CNR1 (0.56) | CNR1CNR2CYP2A6MAOARAB9A | |
| SCHEMBL29402697 | 0.82 | CNR1 (0.45) | CNR1CNR2CYP2A6MAOARAB9A | |
| SCHEMBL29403837 | 0.80 | CNR1 (0.46) | CNR1CNR2CYP2A6MAOARAB9A | |
| SCHEMBL23152138 | 0.80 | CNR1 (0.46) | CNR1CNR2CYP2A6MAOARAB9A | |
| SCHEMBL14191435 | 0.78 | RAB9A (0.64) | CNR1CNR2CYP2A6TDP1MAOA | |
| SCHEMBL30463386 | 0.76 | IDO1 (0.56) | TDP1MAOAMAOB | |
| SCHEMBL30529774 | 0.75 | GRM5 (0.43) | MAOAMAOB | |
| SCHEMBL2227910 | 0.74 | PTGER4 (0.45) | TDP1MAOARAB9A | |
| SCHEMBL29364479 | 0.74 | PTGER4 (0.45) | TDP1MAOARAB9A | |
| SCHEMBL5198075 | 0.73 | MAPT (0.51) | CNR1CNR2RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111413849-B | Photosensitive composition, preparation method thereof, pattern forming method and application | 常州强力先端电子材料有限公司 | 2024-03-01 | — | — | CN | disclosed |