Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR1 | P21554 | 2/20 | 0.46 |
| ▸ | CNR2 | P34972 | 2/20 | 0.46 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | MAOA | P21397 | 1/20 | 0.40 |
| ▸ | ALOX5 | P09917 | 6/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.40 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29403837 | 1.00 | CNR1 (0.46) | CNR1CNR2CYP17A1RAB9AMAOA | |
| SCHEMBL29400404 | 0.85 | CNR1 (0.56) | CNR1CNR2RAB9AMAOAALOX5 | |
| SCHEMBL30849712 | 0.80 | CNR1 (0.48) | CNR1CNR2CYP17A1RAB9AMAOA | |
| SCHEMBL29402697 | 0.74 | CNR1 (0.45) | CNR1CNR2RAB9AMAOAALOX5 | |
| SCHEMBL5198075 | 0.71 | MAPT (0.51) | CNR1CNR2RAB9A | |
| SCHEMBL31080927 | 0.71 | SCN8A (0.36) | CNR1CNR2CYP1A2CYP2A6ALDH1A1 | |
| SCHEMBL30463386 | 0.71 | IDO1 (0.56) | MAOA | |
| SCHEMBL10400372 | 0.69 | RAB9A (0.74) | CNR1CNR2RAB9AMAOAALOX5 | |
| SCHEMBL14191435 | 0.69 | RAB9A (0.64) | CNR1CNR2RAB9AMAOAALOX5 | |
| SCHEMBL15610594 | 0.69 | ALDH1A1 (0.40) | CYP1A2CYP2A6ALDH1A1HPGDHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021057813-A1 | SULFIMIDE PHOTO-ACID GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, USE OF PHOTOSENSITIVE RESIN COMPOSITION | 常州强力先端电子材料有限公司 | 2021-04-01 | — | — | WO | disclosed |