SCHEMBL29400404

SCHEMBL29400404

c1ccc2cc(COc3c4ccccc4c(OCc4ccc5ccccc5c4)c4ccccc34)ccc2c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR1 P21554 3/20 0.56
CNR2 P34972 3/20 0.56
RAB9A P51151 1/20 0.54
ALOX5 P09917 1/20 0.52
CYP1A2 P05177 1/20 0.48
CYP2A6 P11509 1/20 0.48
MAOA P21397 1/20 0.46
MAOB P27338 1/20 0.46
SLC6A2 P23975 3/20 0.45
SLC6A4 P31645 3/20 0.45
SLC6A3 Q01959 3/20 0.45
HTR2A P28223 1/20 0.45
HTR2C P28335 1/20 0.45
HTR7 P34969 1/20 0.45
HTR2B P41595 1/20 0.45
HTR3A P46098 1/20 0.45
HTR4 Q13639 1/20 0.45
BCHE P06276 1/20 0.44
LTA4H P09960 1/20 0.44
PLA2G2A P14555 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30849712 0.87 CNR1 (0.48) CNR1CNR2RAB9AALOX5CYP1A2
SCHEMBL23152138 0.85 CNR1 (0.46) CNR1CNR2RAB9AALOX5CYP1A2
SCHEMBL29403837 0.85 CNR1 (0.46) CNR1CNR2RAB9AALOX5CYP1A2
SCHEMBL29402697 0.84 CNR1 (0.45) CNR1CNR2RAB9AALOX5CYP1A2
SCHEMBL10400372 0.82 RAB9A (0.74) CNR1CNR2RAB9AALOX5CYP1A2
SCHEMBL5198075 0.81 MAPT (0.51) CNR1CNR2RAB9ABCHE
SCHEMBL12938497 0.80 ALOX5 (0.78) CNR1CNR2RAB9AALOX5CYP1A2
SCHEMBL8994871 0.80 RAB9A (0.67) CNR1CNR2RAB9AALOX5CYP1A2
SCHEMBL29098899 0.80 CNR1 (0.46) CNR1CNR2RAB9AALOX5MAOA
SCHEMBL1262275 0.78 CYP1A2 (0.54) CNR1CNR2RAB9AALOX5CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111413849-B Photosensitive composition, preparation method thereof, pattern forming method and application 常州强力先端电子材料有限公司 2024-03-01 CN disclosed
CN-114114839-A Photosensitive resin composition, patterning method and application of photosensitive resin composition 常州强力先端电子材料有限公司 2022-03-01 CN disclosed