SCHEMBL30874017

SCHEMBL30874017

OCc1ccc(Oc2ccc3cc(-c4cccc5ccccc45)ccc3c2-c2c(Oc3ccc(CO)cc3-c3cccc4c3sc3ccccc34)ccc3cc(-c4cccc5ccccc45)ccc23)c(-c2cccc3c2sc2ccccc23)c1

nearest known ligand 0.41

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 1/20 0.41
S1PR5 Q9H228 9/20 0.37
S1PR4 O95977 6/20 0.36
PPARG P37231 4/20 0.33
PPARA Q07869 4/20 0.33
FFAR4 Q5NUL3 2/20 0.33
PARP14 Q460N5 1/20 0.33
F9 P00740 1/20 0.32
PRKDC P78527 1/20 0.32
GPR84 Q9NQS5 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30874108 0.94 ALOX5 (0.40) ALOX5S1PR5S1PR4FFAR4PARP14
SCHEMBL30874094 0.92 ALOX5 (0.39) ALOX5S1PR5S1PR4FFAR4PARP14
SCHEMBL30874009 0.88 PPARG (0.38) ALOX5PPARGPPARAFFAR4GPR84
SCHEMBL30874090 0.86 GPR84 (0.39) ALOX5S1PR5PPARGPPARAFFAR4
SCHEMBL30874119 0.85 ALOX5 (0.47) ALOX5S1PR5S1PR4FFAR4PARP14
SCHEMBL30874056 0.85 PPARG (0.40) PPARGPPARAFFAR4GPR84
SCHEMBL30874060 0.84 SLC6A9 (0.39) ALOX5PPARGPPARAFFAR4GPR84
SCHEMBL30874003 0.82 SLC6A9 (0.44) PPARGPPARAFFAR4GPR84
SCHEMBL30873989 0.82 ALOX5 (0.47) ALOX5S1PR5S1PR4PARP14PRKDC
SCHEMBL30874072 0.81 ALOX5 (0.34) ALOX5S1PR5PPARGPPARAFFAR4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4594286-A1 OLIGOMERIC BINAPHTYL COMPOUNDS AND THERMOPLASTIC RESINS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-08-06 EP disclosed
WO-2024068860-A1 OLIGOMERIC BINAPHTYL COMPOUNDS AND THERMOPLASTIC RESINS REUTER CHEMISCHE APPARATEBAU E.K. (DE) 2024-04-04 WO disclosed