SCHEMBL30874320

SCHEMBL30874320

CS(=O)(=O)c1ccc(-c2nc(-c3ccccc3)c(-c3ccccc3)[nH]2)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PTGS1 P23219 4/20 0.74
▸ PTGS2 P35354 4/20 0.74
▸ MAPK14 Q16539 4/20 0.68
▸ ALDH1A1 P00352 3/20 0.68
▸ MAPK11 Q15759 3/20 0.68
▸ ALOX5 P09917 1/20 0.68
▸ CSNK1A1 P48729 1/20 0.68
▸ CSNK1D P48730 1/20 0.68
▸ CSNK1E P49674 1/20 0.68
▸ SMN1; SMN2 Q16637 1/20 0.68
▸ CSNK1A1L Q8N752 1/20 0.68
▸ HPGD P15428 2/20 0.61
▸ MAPK13 O15264 2/20 0.61
▸ MAPK12 P53778 2/20 0.61
▸ GCGR P47871 1/20 0.61
▸ NOX1 Q9Y5S8 1/20 0.61
▸ KDM4E B2RXH2 1/20 0.60
▸ GLA P06280 1/20 0.60
▸ GAA P10253 1/20 0.60
▸ KMT2A Q03164 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7088574 0.87 PTGS1 (0.65) PTGS1PTGS2MAPK14ALDH1A1MAPK11
SCHEMBL5597068 0.87 PTGS1 (0.75) PTGS1PTGS2MAPK14ALDH1A1MAPK11
SCHEMBL7090803 0.85 PTGS1 (0.62) PTGS1PTGS2MAPK14ALDH1A1MAPK11
SCHEMBL5074753 0.84 MAPK13 (0.83) MAPK14ALDH1A1MAPK11ALOX5HPGD
SCHEMBL5500317 0.83 SCD (0.54) PTGS1PTGS2MAPK14ALDH1A1MAPK11
SCHEMBL16667652 0.82 MAPK13 (0.83) MAPK14ALDH1A1MAPK11ALOX5HPGD
Benzene SCHEMBL28852698 0.82 MAPK13 (0.82) MAPK14ALDH1A1MAPK11ALOX5HPGD
SCHEMBL104130 0.82 MAPK13 (0.82) MAPK14ALDH1A1MAPK11ALOX5HPGD
SCHEMBL7088734 0.82 PTGS2 (0.58) PTGS1PTGS2MAPK14ALDH1A1MAPK11
SCHEMBL7088730 0.82 PTGS2 (0.58) PTGS1PTGS2MAPK14ALDH1A1MAPK11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113314402-B Photoresist composition and method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2025-03-25 — — CN disclosed
CN-113311661-B Photoresist underlayer composition and method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2024-10-15 — — CN disclosed
CN-113805435-B Photoresist and method 台湾积体电路制造股份有限公司 2024-05-28 — — CN disclosed
CN-110955112-B Photoresist composition and method for forming photoresist pattern 台湾积体电路制造股份有限公司 2024-04-26 — — CN disclosed
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