SCHEMBL308805

SCHEMBL308805

Cc1ccc(-c2nnc(C(Cl)(Cl)Cl)o2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 13/20 0.56
RAB9A P51151 13/20 0.56
SMN1; SMN2 Q16637 10/20 0.56
HPGD P15428 4/20 0.56
POLB P06746 2/20 0.56
NFKB1 P19838 2/20 0.56
NFKB2 Q00653 2/20 0.56
RELA Q04206 2/20 0.56
KDM4E B2RXH2 8/20 0.55
KMT2A Q03164 4/20 0.51
ALDH1A1 P00352 5/20 0.47
MAPT P10636 4/20 0.47
TP53 P04637 3/20 0.47
CYP1A2 P05177 2/20 0.47
CYP3A4 P08684 2/20 0.47
CYP2C9 P11712 2/20 0.47
HSD17B10 Q99714 2/20 0.47
TSHR P16473 2/20 0.47
ALOX12 P18054 1/20 0.46
MEN1 O00255 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14577297 0.90 NPC1 (0.46) NPC1RAB9ASMN1; SMN2HPGDPOLB
SCHEMBL196021 0.83 RAB9A (0.56) NPC1RAB9ASMN1; SMN2HPGDNFKB1
SCHEMBL11219347 0.83 NPC1 (0.43) NPC1RAB9ASMN1; SMN2HPGDPOLB
SCHEMBL16997497 0.83 NPC1 (0.58) NPC1RAB9ASMN1; SMN2HPGDPOLB
SCHEMBL274992 0.83 NPC1 (0.58) NPC1RAB9ASMN1; SMN2HPGDPOLB
SCHEMBL22116919 0.81 NPC1 (0.56) NPC1RAB9ASMN1; SMN2HPGDPOLB
SCHEMBL10226381 0.81 RAB9A (0.64) NPC1RAB9ASMN1; SMN2HPGDPOLB
SCHEMBL12922929 0.81 NPC1 (0.40) NPC1RAB9ASMN1; SMN2HPGDPOLB
SCHEMBL195055 0.81 NPC1 (0.61) NPC1RAB9ASMN1; SMN2HPGDPOLB
SCHEMBL275284 0.81 NPC1 (0.60) NPC1RAB9ASMN1; SMN2HPGDPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2154162-B1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED MATERIAL SHOWA DENKO KK (JP) 2019-07-17 EP disclosed
US-20140283702-A1 LITHOGRAPHIC PRINTING PLATE SUPPORT AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MITSUBISHI PAPER MILLS LIMITED (JP) 2014-09-25 US disclosed
US-8647813-B2 Photosensitive composition and photosensitive lithographic printing plate material MITSUBISHI PAPER MILLS LIMITED (JP) 2014-02-11 US disclosed
US-8647813-B2 Photosensitive composition and photosensitive lithographic printing plate material MITSUBISHI PAPER MILLS LIMITED (JP) 2014-02-11 US disclosed
US-8632953-B2 Process for making lithographic printing plate FUJIFILM CORPORATION (JP) 2014-01-21 US disclosed
US-8632953-B2 Process for making lithographic printing plate FUJIFILM CORPORATION (JP) 2014-01-21 US disclosed
US-8399569-B2 Reactive urethane compound having ether bond, curable composition, and cured material SHOWA DENKO K.K. (JP) 2013-03-19 US disclosed
US-8400592-B2 Polarizing plate and liquid crystal display FUJIFILM CORPORATION (JP) 2013-03-19 US disclosed
US-8400592-B2 Polarizing plate and liquid crystal display FUJIFILM CORPORATION (JP) 2013-03-19 US disclosed
US-20130022927-A1 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL MITSUBISHI PAPER MILLS LIMITED (JP) 2013-01-24 US disclosed
US-20070243370-A1 Optical film, polarizing plate and image display device FUJIFILM CORPORATION (JP) 2007-10-18 US disclosed
US-20070243370-A1 Optical film, polarizing plate and image display device FUJIFILM CORPORATION (JP) 2007-10-18 US disclosed
US-20070231566-A1 Optical film, polarizing plate, image display, and manufacturing method of optical film FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
US-20070231566-A1 Optical film, polarizing plate, image display, and manufacturing method of optical film FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
WO-2007100143-A1 POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY FUJIFILM CORPORATION (JP) 2007-09-07 WO disclosed
US-7244547-B2 Photosensitive composition and image recording material using the same FUJIFILM CORPORATION (JP) 2007-07-17 US disclosed
US-7244547-B2 Photosensitive composition and image recording material using the same FUJIFILM CORPORATION (JP) 2007-07-17 US disclosed
US-20070104896-A1 Optical film, polarizing plate and image display device FUJIFILM CORPORATION (JP) 2007-05-10 US disclosed
US-20070104896-A1 Optical film, polarizing plate and image display device FUJIFILM CORPORATION (JP) 2007-05-10 US disclosed
US-20040157140-A1 Photosensitive coloring composition, color filter using the composition and method of producing the same SHOWA DENKO K.K. (JP) 2004-08-12 US disclosed