⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18315361 | 0.83 | — | — | |
| SCHEMBL3647863 | 0.81 | OPRM1 (0.50) | — | |
| SCHEMBL10438957 | 0.80 | — | — | |
| SCHEMBL20615269 | 0.80 | — | — | |
| SCHEMBL309584 | 0.80 | — | — | |
| SCHEMBL18315356 | 0.79 | OPRM1 (0.48) | — | |
| SCHEMBL10698569 | 0.79 | OPRM1 (0.48) | — | |
| SCHEMBL20457741 | 0.78 | — | — | |
| SCHEMBL28394483 | 0.78 | GRIK1 (0.31) | — | |
| SCHEMBL8644870 | 0.76 | RRM1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114507164-B | Gemini surfactant, preparation method, composition and application thereof | 中国石油天然气股份有限公司 | 2023-10-24 | — | — | CN | claimed |
| CN-114507164-A | Gemini surfactant, preparation method, composition and application thereof | 中国石油天然气股份有限公司 | 2022-05-17 | — | — | CN | claimed |
| CN-114507164-B | Gemini surfactant, preparation method, composition and application thereof | 中国石油天然气股份有限公司 | 2023-10-24 | — | — | CN | disclosed |
| US-20230257415-A1 | COMPOUNDS FOR TREATING CNS DISORDERS | SAGE THERAPEUTICS, INC. | 2023-08-17 | — | — | US | disclosed |
| CN-114507164-A | Gemini surfactant, preparation method, composition and application thereof | 中国石油天然气股份有限公司 | 2022-05-17 | — | — | CN | disclosed |
| CN-114127150-A | Allophanate-based dispersants | 巴斯夫欧洲公司 | 2022-03-01 | — | — | CN | disclosed |
| EP-3666767-B1 | PHTHALAZINONE DERIVATIVES, METHOD FOR THEIR PREPARATION THEREOF, PHARMACEUTICAL COMPOSITION COMPRISING THEM, AND THEIR USE | SHANGHAI INST MATERIA MEDICA CAS (CN) | 2021-12-01 | — | — | EP | disclosed |
| US-11040952-B2 | Phthalazinone compound, method for preparation thereof, pharmaceutical composition thereof, and use thereof | SHANGHAI INSTITUTE OF MATERIA MEDICA, CHINESE ACADEMY OF SCIENCES (CN) | 2021-06-22 | — | — | US | disclosed |
| US-10920179-B2 | Cleaning solution and method for cleaning substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| EP-3666767-A1 | PYRIDAZINONE COMPOUND, METHOD FOR PREPARATION THEREOF, PHARMACEUTICAL COMPOSITION THEREOF, AND USE THEREOF | Shanghai Institute of Materia Medica, Chinese Academy of Sciences (CN) | 2020-06-17 | — | — | EP | disclosed |
| US-20200181109-A1 | PHTHALAZINONE COMPOUND, METHOD FOR PREPARATION THEREOF, PHARMACEUTICAL COMPOSITION THEREOF, AND USE THEREOF | SHANGHAI INSTITUTE OF MATERIA MEDICA, CHINESE ACADEMY OF SCIENCES (CN) | 2020-06-11 | — | — | US | disclosed |
| US-6413647-B1 | USEFUL AS INTERLAYER DIELECTRIC FILM IN SEMICONDUCTOR DEVICES; MECHANICAL STRENGTH | JSR CORPORATION (JP) | 2002-07-02 | — | — | US | disclosed |
| US-6410151-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6410150-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| US-4252701-A | Modified cyclopentadiene resins, process for preparing the same, and a composition for printing ink containing said modified resins as vehicle components | NIPPON ZEON CO. LTD. (JP) | 1981-02-24 | — | — | US | disclosed |