Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 1/20 | 0.54 |
| ▸ | CA1 | P00915 | 1/20 | 0.54 |
| ▸ | CA2 | P00918 | 1/20 | 0.54 |
| ▸ | CA6 | P23280 | 1/20 | 0.54 |
| ▸ | CA9 | Q16790 | 1/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | KMO | O15229 | 1/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | UNG | P13051 | 1/20 | 0.48 |
| ▸ | DAO | P14920 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.47 |
| ▸ | GAA | P10253 | 2/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | USP2 | O75604 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Isophthalic Acid SCHEMBL9008985 | 0.89 | CA12 (0.56) | CA12CA1CA2CA6CA9 | |
| Isophthalic Acid SCHEMBL28834662 | 0.86 | CA12 (0.62) | CA12CA1CA2CA6CA9 | |
| Isophthalic Acid SCHEMBL123940 | 0.86 | CA12 (0.62) | CA12CA1CA2CA6CA9 | |
| SCHEMBL167439 | 0.86 | FURIN (0.43) | TSHRL3MBTL1TDP1MAPTATM | |
| SCHEMBL4105605 | 0.84 | TDP1 (0.56) | L3MBTL1TDP1MEN1ALDH1A1MAPT | |
| SCHEMBL17421702 | 0.84 | FURIN (0.41) | TSHRL3MBTL1TDP1KDM4EALDH1A1 | |
| Isophthalic Acid SCHEMBL28397170 | 0.84 | CA12 (0.65) | CA12CA1CA2CA6CA9 | |
| Isophthalic Acid SCHEMBL102783 | 0.84 | CA12 (0.65) | CA12CA1CA2CA6CA9 | |
| SCHEMBL6252421 | 0.84 | FURIN (0.41) | TSHRL3MBTL1TDP1KDM4EALDH1A1 | |
| Isophthalic Acid SCHEMBL209121 | 0.84 | CA12 (0.65) | CA12CA1CA2CA6CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230314941-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230314939-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230314939-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230314941-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| CN-116670184-A | Polymerizable compound, active energy ray-curable resin composition, cured product, resist composition, and resist film | DIC株式会社 | 2023-08-29 | — | — | CN | disclosed |
| US-20230161250-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161250-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161244-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| CN-102112922-A | Positive photosensitive composition and permanent resist | ADEKA CORP | 2011-06-29 | — | — | CN | disclosed |
| WO-2010151797-A2 | COMPOUNDS FOR MODULATING RNA BINDING PROTEINS AND USES THEREFOR | UNIVERSITY OF MASSACHUSETTS (US) | 2010-12-29 | — | — | WO | disclosed |
| US-20100273104-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | A D E K A (ADEKA CORPORATION) (JP) | 2010-10-28 | — | — | US | disclosed |
| CN-101855598-A | Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist | ADEKA CORP | 2010-10-06 | — | — | CN | disclosed |
| EP-2216682-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | Adeka Corporation (JP) | 2010-08-11 | — | — | EP | disclosed |
| US-20080206493-A1 | METHOD FOR PRODUCING OPTICAL FILM AND OPTICAL FILM | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080206493-A1 | METHOD FOR PRODUCING OPTICAL FILM AND OPTICAL FILM | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| WO-2007100851-A1 | THERAPEUTIC COMPOUNDS | HELICON THERAPEUTICS, INC. (US) | 2007-09-07 | — | — | WO | disclosed |
| EP-1383860-A1 | FABRIC CARE COMPOSITIONS | Unilever Plc (GB) | 2004-01-28 | — | — | EP | disclosed |
| WO-2002088293-A1 | FABRIC CARE COMPOSITIONS | UNILEVER PLC (GB) | 2002-11-07 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230161250-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RIMKLA, GAR1, PCCA | CA12 464/4885CA1 122/4885CA2 931/4885 |
| US-20230314939-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-10, H1-0, HCAR1 | CA12 762/4885CA1 266/4885CA2 515/4885 |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | HCAR1, H1-0, H1-10 | CA12 1205/4885CA1 469/4885CA2 772/4885 |
| US-20230161244-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | GAR1, RER1, RIMKLA | CA12 305/4885CA1 89/4885CA2 834/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.