Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoroacetic Acid SCHEMBL952047 | 0.82 | — | — | |
| Trifluoroacetic Acid SCHEMBL3140803 | 0.79 | TP53 (0.44) | ALDH1A1TP53TSHRL3MBTL1 | |
| Trifluoroacetic Acid SCHEMBL27714775 | 0.79 | TP53 (0.44) | ALDH1A1TP53TSHRL3MBTL1 | |
| Trifluoroacetic Acid SCHEMBL29830959 | 0.79 | — | — | |
| Trifluoroacetic Acid SCHEMBL3055318 | 0.77 | ALDH1A1 (0.38) | ALDH1A1TP53TSHRL3MBTL1 | |
| Trifluoroacetic Acid SCHEMBL3416090 | 0.77 | SLC7A5 (0.41) | ALDH1A1TP53TSHRL3MBTL1 | |
| Trifluoroacetic Acid SCHEMBL5493316 | 0.77 | RNPEP (0.36) | ALDH1A1TP53TSHRL3MBTL1 | |
| Trifluoroacetic Acid SCHEMBL1035693 | 0.77 | TP53 (0.42) | ALDH1A1TP53TSHRL3MBTL1 | |
| Trifluoroacetic Acid SCHEMBL20854191 | 0.77 | ALDH1A1 (0.35) | ALDH1A1TP53TSHRL3MBTL1 | |
| Trifluoroacetic Acid SCHEMBL7209644 | 0.77 | ALDH1A1 (0.35) | ALDH1A1TP53TSHRL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1778759-A1 | PHOTOSENSITIVE DIELECTRIC RESIN COMPOSITIONS AND THEIR USES | Promerus, LLC (US) | 2007-05-02 | — | — | EP | claimed |
| WO-2006017035-A1 | PHOTOSENSITIVE DIELECTRIC RESIN COMPOSITIONS AND THEIR USES | PROMERUS LLC (US) | 2006-02-16 | — | — | WO | claimed |
| US-20060008734-A1 | Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films | SUMITOMO BAKELITE CO., LTD. (JP) | 2006-01-12 | — | — | US | claimed |
| CN-1554680-A | In mold addition polymerization composition of norbornene-type monomers and its crosslinking addition polymer | ס�ѵ�ľ��ʽ���� | 2004-12-15 | — | — | CN | claimed |
| CN-1333788-A | In-mold addition polymerization of norbornene-type monomers using group 10 metal complexes | GOODRICH CO B F (US) | 2002-01-30 | — | — | CN | claimed |
| CN-120152955-A | Compositions comprising isomer mixtures of itaconimide norbornene and citraconimide norbornene | 3M创新有限公司 | 2025-06-13 | — | — | CN | disclosed |
| CN-117295752-A | Monomers, polymerizable compositions, and polymers derived therefrom | 3M创新有限公司 | 2023-12-26 | — | — | CN | disclosed |
| CN-116490538-A | Curable composition, syntactic foam, method of preparing syntactic foam, and article comprising syntactic foam | 3M创新有限公司 | 2023-07-25 | — | — | CN | disclosed |
| US-8986923-B2 | Aqueous base-developable negative-tone films based on functionalized norbornene polymers | PROMERUS, LLC (US) | 2015-03-24 | — | — | US | disclosed |
| US-20140038112-A1 | AQUEOUS BASE-DEVELOPABLE NEGATIVE-TONE FILMS BASED ON FUNCTIONALIZED NORBORNENE POLYMERS | PROMERUS, LLC (US) | 2014-02-06 | — | — | US | disclosed |
| US-8580477-B2 | Aqueous base-developable negative-tone films based on functionalized norbornene polymers | PROMERUS LLC (US) | 2013-11-12 | — | — | US | disclosed |
| US-8329838-B2 | Norbornene-type polymers, compositions thereof and lithographic processes using such compositions | PROMERUS LLC (US) | 2012-12-11 | — | — | US | disclosed |
| WO-2006017035-A1 | PHOTOSENSITIVE DIELECTRIC RESIN COMPOSITIONS AND THEIR USES | PROMERUS LLC (US) | 2006-02-16 | — | — | WO | disclosed |
| US-20060008734-A1 | Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films | SUMITOMO BAKELITE CO., LTD. (JP) | 2006-01-12 | — | — | US | disclosed |
| US-20050186502-A1 | Directly photodefinable polymer compositions and methods thereof | SUMITOMO BAKELITE CO., LTD. (JP) | 2005-08-25 | — | — | US | disclosed |
| WO-2005076076-A2 | DIRECTLY PHOTODEFINABLE POLYMER COMPOSITIONS AND METHODS THEREOF | PROMERUS, LLC (US) | 2005-08-18 | — | — | WO | disclosed |
| CN-1554680-A | In mold addition polymerization composition of norbornene-type monomers and its crosslinking addition polymer | ס�ѵ�ľ��ʽ���� | 2004-12-15 | — | — | CN | disclosed |
| CN-1555387-A | Polymer composition for manufacturing optical waveguide, optical waveguide manufactured thereby, and method for manufacturing the waveguide | 古德里奇公司 | 2004-12-15 | — | — | CN | disclosed |
| CN-1333788-A | In-mold addition polymerization of norbornene-type monomers using group 10 metal complexes | GOODRICH CO B F (US) | 2002-01-30 | — | — | CN | disclosed |
| CN-1290275-A | Catalyst and process for polymerization of cycloolefin | GOODRICH CO B F (US) | 2001-04-04 | — | — | CN | disclosed |