SCHEMBL309239

SCHEMBL309239

CCCOC(C)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22135574 0.84 HSD17B10 (0.41)
SCHEMBL349894 0.83 ALDH1A1 (0.35)
SCHEMBL309205 0.82
SCHEMBL11300668 0.80
Hydrochloric Acid SCHEMBL25266186 0.80
SCHEMBL531227 0.80 LMNA (0.53)
SCHEMBL243711 0.79
SCHEMBL11057692 0.78 DNM1 (0.56)
SCHEMBL11300461 0.78 DNM1 (0.56)
SCHEMBL3028563 0.78 DNM1 (0.56)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 169 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119208740-A Low-temperature fluorine-containing rechargeable magnesium battery electrolyte and preparation method and application thereof 重庆新型储能材料与装备研究院 2024-12-27 CN claimed
CN-116382046-A Color photoresist stripper composition and stripper composition for silicon oxide film 株式会社东进世美肯 2023-07-04 CN claimed
CN-107847400-A Purposes of the activating agent in chemical treatment 欧莱雅 2018-03-27 CN claimed
EP-2864439-A1 GLYCOL ETHER AMINES FOR USE AS CLAY AND SHALE INHIBITION AGENTS FOR THE DRILLING INDUSTRY Dow Global Technologies LLC (US) 2015-04-29 EP claimed
WO-2014004193-A1 GLYCOL ETHER AMINES FOR USE AS CLAY AND SHALE INHIBITION AGENTS FOR THE DRILLING INDUSTRY DOW GLOBAL TECHNOLOGIES LLC (US) 2014-01-03 WO claimed
EP-2613867-A1 MIXED AMINE AND NON-NUCLEOPHILIC BASE CO2 SCRUBBING PROCESS FOR IMPROVED ADSORPTION AT INCREASED TEMPERATURES ExxonMobil Research and Engineering Company (US) 2013-07-17 EP claimed
CN-1997777-B Method of anodizing metallic surfaces and compositions CHEMETALL GMBH 2012-08-22 CN claimed
US-8143408-B2 N-(8-heteroaryltetrahydronaphtalene-2yl) or N-(5-heteroarylchromane-3-yl) carboxamide derivatives for the treatment of pain ASTRAZENECA AB (SE) 2012-03-27 US claimed
WO-2012034003-A1 MIXED AMINE AND NON-NUCLEOPHILIC BASE CO2 SCRUBBING PROCESS FOR IMPROVED ADSORPTION AT INCREASED TEMPERATURES EXXONMOBIL RESEARCH AND ENGINEERING COMPANY (US) 2012-03-15 WO claimed
US-20100137322-A1 NOVEL N-(8-HETEROARYLTETRAHYDRONAPHTALENE-2YL) OR N-(5-HETEROARYLCHROMANE-3-YL) CARBOXAMIDE DERIVATIVES FOR THE TREATMENT OF PAIN ASTRAZENECA AB (SE) 2010-06-03 US claimed
EP-2183220-A1 BIODEGRADABLE SOLVENTS FOR THE CHEMICAL INDUSTRY Dublin City University (IE) 2010-05-12 EP claimed
EP-2158198-A2 NOVEL N- (8HETEROARYLTETRAHYDRONAPHTALENE-2YL) OR N- (5- HETEROARYLCHROMANE-3-YL) CARBOXAMIDE DERIVATIVES FOR THE TREATMENT OF PAIN AstraZeneca AB (SE) 2010-03-03 EP claimed
WO-2009024607-A1 BIODEGRADABLE SOLVENTS FOR THE CHEMICAL INDUSTRY DUBLIN CITY UNIVERSITY (IE) 2009-02-26 WO claimed
WO-2008130320-A2 NOVEL N- (8-HETEROARYLTETRAHYDRONAPHTALENE-2YL) OR N- (5- HETEROARYLCHROMANE-3-YL) CARBOXAMIDE DERIVATIVES FOR THE TREATMENT OF PAIN ASTRAZENECA AB (SE) 2008-10-30 WO claimed
CN-1997777-A Method of anodizing metallic surfaces and compositions CHEMETALL GMBH (DE) 2007-07-11 CN claimed
US-6478834-B2 USE OF A POLISHING GRAIN, AN OXIDIZING AGENT AND A HIGHER-MONO-PRIMARY AMINE SUPPRESSES DISHING AND EROSION WHEN FORMING A BURIED INTERCONNECTION OF A COPPER-BASED METAL ON A TANTALUM BASED BARRIER FILM NEC CORP. (JP) 2002-11-12 US claimed
US-20020104268-A1 Slurry for chemical mechanical polishing NEC CORPORATION 2002-08-08 US claimed
EP-0400657-A2 Process for developing of ps plates requiring no dampening water Fuji Photo Film Co., Ltd. (JP) 1990-12-05 EP claimed
US-4609747-A Novel water-soluble antimony compounds and their preparation ATLANTIC RICHFIELD (US) 1986-09-02 US claimed
EP-3758947-B1 HEAT SENSITIVE RECORDING MATERIAL AND COLOR DEVELOPER SOLENIS TECHNOLOGIES CAYMAN LP (KY) 2025-05-14 EP disclosed
CN-119208740-A Low-temperature fluorine-containing rechargeable magnesium battery electrolyte and preparation method and application thereof 重庆新型储能材料与装备研究院 2024-12-27 CN disclosed
CN-113574041-B Bisphenol production method and polycarbonate resin production method 三菱化学株式会社 2023-10-13 CN disclosed
CN-116382046-A Color photoresist stripper composition and stripper composition for silicon oxide film 株式会社东进世美肯 2023-07-04 CN disclosed
CN-112601668-B Thermosensitive recording material and color-developing agent 索理思科技开曼公司 2022-07-29 CN disclosed
CN-113574041-A Method for producing bisphenol and method for producing polycarbonate resin 三菱化学株式会社 2021-10-29 CN disclosed
CN-112601668-A Thermosensitive recording material and color-developing agent 索理思科技开曼公司 2021-04-02 CN disclosed
CN-108699694-B Electroless plating base agent comprising highly branched polymer and metal fine particles 日产化学株式会社 2021-03-12 CN disclosed
US-10920179-B2 Cleaning solution and method for cleaning substrate TOKYO OHKA KOGYO CO., LTD. (JP) 2021-02-16 US disclosed
EP-3758947-A1 HEAT SENSITIVE RECORDING MATERIAL AND COLOR DEVELOPER Solenis Technologies Cayman, L.P. (KY) 2021-01-06 EP disclosed
WO-2020189201-A1 METHOD FOR PRODUCING BISPHENOL AND METHOD FOR PRODUCING POLYCARBONATE RESIN 三菱ケミカル株式会社 2020-09-24 WO disclosed
EP-3533619-A1 HEAT SENSITIVE RECORDING MATERIAL AND COLOR DEVELOPER BASF SE (DE) 2019-09-04 EP disclosed
US-20190256805-A1 CLEANING SOLUTION AND METHOD FOR CLEANING SUBSTRATE TOKYO OHKA KOGYO CO., LTD. (JP) 2019-08-22 US disclosed
CN-109803727-A Method for treating materials comprising amine salts of carboxylic acids having 4 to 10 carbon atoms 因诺斯佩克有限公司 2019-05-24 CN disclosed
US-10119103-B2 Cleaning liquid and method for cleaning TOKYO OHKA KOGYO CO., LTD. (JP) 2018-11-06 US disclosed
CN-107847400-A Purposes of the activating agent in chemical treatment 欧莱雅 2018-03-27 CN disclosed
CN-107708833-A Filter media and elements with fine staple fibers 霍林斯沃思和沃斯有限公司 2018-02-16 CN disclosed
US-20170288052-A1 Multiple Shielding Trench Gate FET TEXAS INSTRUMENTS INC (US) 2017-10-05 US disclosed
US-20170253840-A1 CLEANING LIQUID AND METHOD FOR CLEANING TOKYO OHKA KOGYO CO., LTD. (JP) 2017-09-07 US disclosed
US-9711639-B2 Multiple shielding trench gate FET TEXAS INSTRUMENTS INCORPORATED (US) 2017-07-18 US disclosed
CN-106457148-A Pre-coalesced multi-layer filter media 霍林斯沃思和沃斯有限公司 2017-02-22 CN disclosed
CN-106413836-A Surface modified filter media 霍林斯沃思和沃斯有限公司 2017-02-15 CN disclosed
CN-106019901-A MEANDER CONTROL MEMBER, TRANSFER BELT, TRANSFER UNIT, AND IMAGE-FORMING APPARATUS 富士施乐株式会社 2016-10-12 CN disclosed
CN-105338964-A Mucoadhesive poly-gamma-glutamic acid nano-micelle and drug carrier using same BIOLEADERS CORP 2016-02-17 CN disclosed
CN-105209182-A Method for producing insulating coating layer UBE INDUSTRIES 2015-12-30 CN disclosed
US-20150296646-A1 PROTECTIVE PLATE AND DISPLAY DEVICE SHARP KABUSHIKI KAISHA (JP) 2015-10-15 US disclosed
EP-2562162-B1 N-CYANO-4-AMINO-5-FLUORO-PYRIMIDINE DERIVATIVES AS FUNGICIDES DOW AGROSCIENCES LLC (US) 2015-08-19 EP disclosed
EP-2864439-A1 GLYCOL ETHER AMINES FOR USE AS CLAY AND SHALE INHIBITION AGENTS FOR THE DRILLING INDUSTRY Dow Global Technologies LLC (US) 2015-04-29 EP disclosed
US-8790990-B2 Silica-based film forming material for formation of air gaps, and method for forming air gaps TOKYO OHKA KOGYO CO., LTD. (JP) 2014-07-29 US disclosed
CN-102471576-B Polyimide precursor solution composition containing filler and polyimide film using same UBE INDUSTRIES 2014-05-07 CN disclosed
WO-2014004193-A1 GLYCOL ETHER AMINES FOR USE AS CLAY AND SHALE INHIBITION AGENTS FOR THE DRILLING INDUSTRY DOW GLOBAL TECHNOLOGIES LLC (US) 2014-01-03 WO disclosed
CN-103339169-A Method for producing resin film using electroconductive resin composition NITTO DENKO CORP 2013-10-02 CN disclosed
EP-2613867-A1 MIXED AMINE AND NON-NUCLEOPHILIC BASE CO2 SCRUBBING PROCESS FOR IMPROVED ADSORPTION AT INCREASED TEMPERATURES ExxonMobil Research and Engineering Company (US) 2013-07-17 EP disclosed
CN-103080283-A Low molecular weight polyisobutyl-substituted amines as detergent boosters BASF SE 2013-05-01 CN disclosed
US-8404786-B2 Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same JSR CORPORATION (JP) 2013-03-26 US disclosed
EP-1705208-B1 COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM, AND METHOD FOR FORMING SAME JSR CORP (JP) 2013-03-20 EP disclosed
CN-102167756-B Hyperbranched polymer and method for producing the same NISSAN CHEMICAL IND LTD 2012-12-26 CN disclosed
CN-102167757-B Hyperbranched polymer and method for producing the same NISSAN CHEMICAL IND LTD 2012-12-26 CN disclosed
US-8318582-B2 Method of forming a trench isolation JSR CORPORATION (JP) 2012-11-27 US disclosed
CN-102741384-A Lubricating oil additive and lubricating oil composition containing the same CHEVRON ORONITE CO 2012-10-17 CN disclosed
US-20120238579-A1 New Compounds 806 BESIDKI YEVGENI (SE) 2012-09-20 US disclosed
CN-1997777-B Method of anodizing metallic surfaces and compositions CHEMETALL GMBH 2012-08-22 CN disclosed
CN-102471576-A Polyimide precursor solution composition containing filler and polyimide film using same UBE INDUSTRIES 2012-05-23 CN disclosed
US-8143408-B2 N-(8-heteroaryltetrahydronaphtalene-2yl) or N-(5-heteroarylchromane-3-yl) carboxamide derivatives for the treatment of pain ASTRAZENECA AB (SE) 2012-03-27 US disclosed
WO-2012034003-A1 MIXED AMINE AND NON-NUCLEOPHILIC BASE CO2 SCRUBBING PROCESS FOR IMPROVED ADSORPTION AT INCREASED TEMPERATURES EXXONMOBIL RESEARCH AND ENGINEERING COMPANY (US) 2012-03-15 WO disclosed
US-8093419-B2 Method of producing organosilicon compound JSR CORPORATION (JP) 2012-01-10 US disclosed
CN-102167756-A Hyperbranched polymer and method for producing the same NISSAN CHEMICAL IND LTD 2011-08-31 CN disclosed
CN-102171317-A Lubricating oil additive and lubricating oil composition containing same CHEVRON ORONITE CO 2011-08-31 CN disclosed
CN-102167757-A Hyperbranched polymer and method for producing the same NISSAN CHEMICAL IND LTD 2011-08-31 CN disclosed
EP-1973923-B1 INTERMEDIATE COMPOUND OF TECHNETIUM NITRIDE COMPLEX FOR RADIODIAGNOSTIC IMAGING NIHON MEDIPHYSICS CO LTD (JP) 2011-08-17 EP disclosed
US-20110189833-A1 SILICA-BASED FILM FORMING MATERIAL FOR FORMATION OF AIR GAPS, AND METHOD FOR FORMING AIR GAPS TOKYO OHKA KOGYO CO., LTD. (JP) 2011-08-04 US disclosed
CN-101506246-B Hyperbranched polymer and method for producing same NISSAN CHEMICAL IND LTD 2011-06-22 CN disclosed
US-7939590-B2 Composition for forming silica-based coating film TOKYO OHKA KOGYO CO., LTD. (JP) 2011-05-10 US disclosed
US-20110077364-A1 COMPOSITION CONTAINING SILICON-CONTAINING POLYMER, CURED PRODUCT OF THE COMPOSITION, SILICON-CONTAINING POLYMER, AND METHOD OF PRODUCING THE SILICON-CONTAINING POLYMER JSR CORPORATION (JP) 2011-03-31 US disclosed
US-20110053340-A1 METHOD OF FORMING A TRENCH ISOLATION JSR CORPORATION (JP) 2011-03-03 US disclosed
US-7875317-B2 formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors JSR CORPORATION (JP) 2011-01-25 US disclosed
US-20100168327-A1 POLYMER AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR FORMING INSULATING FILM, AND INSULATING FILM AND METHOD OF FORMING THE SAME JSR CORPORATION (JP) 2010-07-01 US disclosed
US-7736748-B2 Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same JSR CORPORATION (JP) 2010-06-15 US disclosed
US-20100137322-A1 NOVEL N-(8-HETEROARYLTETRAHYDRONAPHTALENE-2YL) OR N-(5-HETEROARYLCHROMANE-3-YL) CARBOXAMIDE DERIVATIVES FOR THE TREATMENT OF PAIN ASTRAZENECA AB (SE) 2010-06-03 US disclosed
EP-2158198-A2 NOVEL N- (8HETEROARYLTETRAHYDRONAPHTALENE-2YL) OR N- (5- HETEROARYLCHROMANE-3-YL) CARBOXAMIDE DERIVATIVES FOR THE TREATMENT OF PAIN AstraZeneca AB (SE) 2010-03-03 EP disclosed
US-20090312487-A1 OXIDE FINE PARTICLE-CONTAINING RESIN COMPOSITION AND PROCESS FOR PRODUCTION THEREOF JSR CORPORATION (JP) 2009-12-17 US disclosed
US-20090299086-A1 METHOD OF PRODUCING ORGANOSILICON COMPOUND JSR CORPORATION (JP) 2009-12-03 US disclosed
EP-1090967-B1 Composition for film formation, method of film formation, and insulating film JSR CORP (JP) 2009-11-11 EP disclosed
CN-101506246-A Hyperbranched polymer and method for producing same NISSAN CHEMICAL IND LTD (JP) 2009-08-12 CN disclosed
EP-2085411-A2 Metal-coating material, method for protecting metal, and light emitting device JSR Corporation (JP) 2009-08-05 EP disclosed
US-20090189510-A1 METAL-COATING MATERIAL, METHOD FOR PROTECTING METAL, AND LIGHT EMITTING DEVICE JSR CORPORATION (JP) 2009-07-30 US disclosed
EP-1127929-B1 Composition for film formation, method of film formation, and silica-based film JSR CORP (JP) 2009-04-15 EP disclosed
US-20090093579-A1 OXIDE PARTICLE-CONTAINING POLYSILOXANE COMPOSITION AND METHOD FOR PRODUCING SAME JSR CORPORATION (JP) 2009-04-09 US disclosed
US-7514151-B2 Insulating film and method for forming the same, and film-forming composition JSR CORPORATION (JP) 2009-04-07 US disclosed
EP-2042561-A1 OXIDE PARTICLE-CONTAINING RESIN COMPOSITION AND METHOD FOR PRODUCING THE SAME JSR Corporation (JP) 2009-04-01 EP disclosed
US-20090050852-A1 Metal Oxide Particle-Containing Polysiloxane Composition and Method for Producing Same JSR CORPORATION (JP) 2009-02-26 US disclosed
US-20090018247-A1 COMPOSITION FOR FORMING SILICA-BASED COATING FILM TOKYO OHKA KOGYO CO., LTD. (JP) 2009-01-15 US disclosed
EP-2013208-A1 PYRIDIN[3,4-B]PYRAZINONES Pfizer Products Inc. (US) 2009-01-14 EP disclosed
EP-1995281-A1 OXIDE PARTICLE-CONTAINING POLYSILOXANE COMPOSITION AND METHOD FOR PRODUCING SAME JSR Corporation (JP) 2008-11-26 EP disclosed
WO-2008130320-A2 NOVEL N- (8-HETEROARYLTETRAHYDRONAPHTALENE-2YL) OR N- (5- HETEROARYLCHROMANE-3-YL) CARBOXAMIDE DERIVATIVES FOR THE TREATMENT OF PAIN ASTRAZENECA AB (SE) 2008-10-30 WO disclosed
EP-1973923-A1 INTERMEDIATE COMPOUND OF TECHNETIUM NITRIDE COMPLEX FOR RADIODIAGNOSTIC IMAGING NIHON MEDI-PHYSICS CO., LTD. (JP) 2008-10-01 EP disclosed
US-20080114115-A1 Composition for forming coating and coating formed of composition TOKYO OHKA KOGYO CO., LTD 2008-05-15 US disclosed
EP-1535976-B1 Composition for film formation, method for preparing the composition, and method for forming insulating film JSR CORP (JP) 2008-01-16 EP disclosed
WO-2007122466-A1 PYRIDINE[3,4-B]PYRAZINONES PFIZER PRODUCTS INC. (US) 2007-11-01 WO disclosed
US-20070185263-A1 COMPOSITION FOR FORMING SILICA-BASED COATING WITH A LOW REFRACTIVE INDEX TOKYO OHKA KOGYO CO., LTD. (JP) 2007-08-09 US disclosed
US-20070185262-A1 COMPOSITION FOR FORMING COLORED SILICA-BASED COATING TOKYO OHKA KOGYO CO., LTD. (JP) 2007-08-09 US disclosed
WO-2007083395-A1 INTERMEDIATE COMPOUND OF TECHNETIUM NITRIDE COMPLEX FOR RADIODIAGNOSTIC IMAGING NIHON MEDI-PHYSICS CO., LTD. (JP) 2007-07-26 WO disclosed
CN-1997777-A Method of anodizing metallic surfaces and compositions CHEMETALL GMBH (DE) 2007-07-11 CN disclosed
US-20070043089-A1 METHOD OF INHIBITING ANGIOGENESIS HAVIV FORTUNA 2007-02-22 US disclosed
US-20070032527-A1 METHOD OF INHIBITING ANGIOGENESIS HAVIV FORTUNA 2007-02-08 US disclosed
US-20070031687-A1 Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same JSR CORPORATION (JP) 2007-02-08 US disclosed
US-20070027287-A1 Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same JSR CORPORATION (JP) 2007-02-01 US disclosed
US-20070020467-A1 Composition for forming insulating film, method for producing same, silica-based insulating film, and method for forming same JSR CORPORATION (JP) 2007-01-25 US disclosed
EP-1746139-A1 COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM AND METHOD FOR FORMING SAME JSR Corporation (JP) 2007-01-24 EP disclosed
EP-1088868-B1 Composition for film formation, method of film formation, and insulating film JSR CORP (JP) 2007-01-24 EP disclosed
US-20060275614-A1 Insulating film and method for forming the same, and film-forming composition JSR CORPORATION (JP) 2006-12-07 US disclosed
WO-2006126082-A2 PYRIDINE [3,4-B] PYRAZINONES AS PDE-5 INHIBITORS PHARMACIA & UPJOHN COMPANY LLC (US) 2006-11-30 WO disclosed
EP-1720856-A2 HIV INTEGRASE INHIBITORS SMITHKLINE BEECHAM CORPORATION (US) 2006-11-15 EP disclosed
EP-1719793-A1 POLYMER AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR FORMING INSULATING FILM, AND INSULATING FILM AND METHOD OF FORMING THE SAME JSR Corporation (JP) 2006-11-08 EP disclosed
EP-1705208-A1 COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM AND METHOD FOR FORMING SAME JSR Corporation (JP) 2006-09-27 EP disclosed
US-20060210812-A1 Insulating film and method of forming the same JSR CORPORATION (JP) 2006-09-21 US disclosed
EP-1696478-A1 INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM JSR Corporation (JP) 2006-08-30 EP disclosed
EP-1122770-B1 Silica-based insulating film and its manufacture JSR CORP (JP) 2006-08-09 EP disclosed
CN-1791333-A Antimicrobial compositions containing ethanolamine buffer and biguanide disinfectant BAUSCH & LOMB (US) 2006-06-21 CN disclosed
US-7026053-B2 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2006-04-11 US disclosed
US-7011868-B2 Fluorine-free plasma curing process for porous low-k materials AXCELIS TECHNOLOGIES, INC. (US) 2006-03-14 US disclosed
EP-1593149-A1 FLUORINE-FREE PLASMA CURING PROCESS FOR POROUS LOW-K-MATERIALS Axcelis Technologies, Inc. (US) 2005-11-09 EP disclosed
WO-2005077050-A2 HIV INTEGRASE INHIBITORS SMITHKLINE BEECHAM CORPORATION (US) 2005-08-25 WO disclosed
CN-1211471-C New fuel oil depurant of hydro poly(oxyalkylene) oxyalkyl amine based compound DAELIM IND CO LTD (KR) 2005-07-20 CN disclosed
US-6902771-B2 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2005-06-07 US disclosed
EP-1535976-A1 Composition for film formation, method for preparing the composition, and method for forming insulating film JSR Corporation (JP) 2005-06-01 EP disclosed
US-20050112386-A1 Composition for film formation, method for preparing the composition, and method for forming insulating film JSR CORPORATION (JP) 2005-05-26 US disclosed
US-20050042464-A1 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2005-02-24 US disclosed
WO-2004066374-A1 FLUORINE-FREE PLASMA CURING PROCESS FOR POROUS LOW-K-MATERIALS AXCELIS TECHNOLOGIES, INC. (US) 2004-08-05 WO disclosed
US-20040116479-A1 Method of inhibiting angiogenesis ABBOTT LABORATORIES 2004-06-17 US disclosed
CN-1146652-C Fuel compositions containing hydrocarbyl-substituted poloxyalkylene amines 切夫里昂奥罗尼特有限责任公司 2004-04-21 CN disclosed
US-20040067985-A1 Method of inhibiting angiogenesis ABBOT LABORATORIES 2004-04-08 US disclosed
US-20040028916-A1 Fluorine-free plasma curing process for porous low-k materials AXCELIS TECHNOLOGIES, INC. 2004-02-12 US disclosed
US-20030157340-A1 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2003-08-21 US disclosed
CN-1432661-A Metal layer forming process and laminated metal foil-based product NIPPON DENKO (JP) 2003-07-30 CN disclosed
US-6478834-B2 USE OF A POLISHING GRAIN, AN OXIDIZING AGENT AND A HIGHER-MONO-PRIMARY AMINE SUPPRESSES DISHING AND EROSION WHEN FORMING A BURIED INTERCONNECTION OF A COPPER-BASED METAL ON A TANTALUM BASED BARRIER FILM NEC CORP. (JP) 2002-11-12 US disclosed
US-20020104268-A1 Slurry for chemical mechanical polishing NEC CORPORATION 2002-08-08 US disclosed
US-20020086167-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2002-07-04 US disclosed
CN-1357030-A New fuel oil depurant of hydro poly(oxyalkylene) oxyalkyl amine based compound DAELIM IND CO LTD (KR) 2002-07-03 CN disclosed
US-6413647-B1 USEFUL AS INTERLAYER DIELECTRIC FILM IN SEMICONDUCTOR DEVICES; MECHANICAL STRENGTH JSR CORPORATION (JP) 2002-07-02 US disclosed
US-6410151-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-6410150-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-20010018129-A1 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2001-08-30 US disclosed
EP-1127929-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-08-29 EP disclosed
EP-1122770-A2 Silica-based insulating film and its manufacture JSR Corporation (JP) 2001-08-08 EP disclosed
CN-1296520-A Fuel compositions containing hydrocarbyl-substituted poloxyalkylene amines CHEVRON CHEM CO (US) 2001-05-23 CN disclosed
EP-1090967-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-11 EP disclosed
EP-1088868-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-04 EP disclosed
CN-1129009-A Fuel additive composition containing aliphatic amines, polyolefins and aryl esters CHEVRON CHEM CO (US) 1996-08-14 CN disclosed
CN-1129010-A Aliphatic hydrocarbyl substd. amine, polyolefin polymer and poly (oxyalkylene) mono ol containing fuel additive compsn. CHEVRON CHEM CO (US) 1996-08-14 CN disclosed
EP-0629232-A4 FUEL ADDITIVE COMPOSITIONS CONTAINING POLY(OXYALKYLENE) HYDROXYAROMATIC ESTERS AND ALIPHATIC AMINES. CHEVRON RES & TECH (US) 1995-08-23 EP disclosed
EP-0628069-A4 FUEL ADDITIVE COMPOSITIONS CONTAINING POLY(OXYALKYLENE) HYDROXYAROMATIC ETHERS AND ALIPHATIC AMINES. CHEVRON RES & TECH (US) 1995-08-16 EP disclosed
EP-0629233-A4 FUEL ADDITIVE COMPOSITIONS CONTAINING ALIPHATIC AMINES AND POLYALKYL HYDROXYAROMATICS. CHEVRON RES & TECH (US) 1995-08-16 EP disclosed
EP-0629233-A1 FUEL ADDITIVE COMPOSITIONS CONTAINING ALIPHATIC AMINES AND POLYALKYL HYDROXYAROMATICS CHEVRON CHEMICAL COMPANY (US) 1994-12-21 EP disclosed
EP-0629232-A1 FUEL ADDITIVE COMPOSITIONS CONTAINING POLY(OXYALKYLENE) HYDROXYAROMATIC ESTERS AND ALIPHATIC AMINES CHEVRON CHEMICAL COMPANY (US) 1994-12-21 EP disclosed
EP-0628069-A1 FUEL ADDITIVE COMPOSITIONS CONTAINING POLY(OXYALKYLENE) HYDROXYAROMATIC ETHERS AND ALIPHATIC AMINES CHEVRON CHEMICAL COMPANY (US) 1994-12-14 EP disclosed
WO-1994014929-A1 FUEL ADDITIVE COMPOSITIONS CONTAINING ALIPHATIC AMINES AND POLYALKYL HYDROXYAROMATICS CHEVRON RESEARCH AND TECHNOLOGY COMPANY, A DIVISION OF CHEVRON U.S.A. INC. (US) 1994-07-07 WO disclosed
WO-1994014706-A1 FUEL ADDITIVE COMPOSITIONS CONTAINING POLY(OXYALKYLENE) HYDROXYAROMATIC ETHERS AND ALIPHATIC AMINES CHEVRON RESEARCH AND TECHNOLOGY COMPANY (US) 1994-07-07 WO disclosed
WO-1994014928-A1 FUEL ADDITIVE COMPOSITIONS CONTAINING POLY(OXYALKYLENE) HYDROXYAROMATIC ESTERS AND ALIPHATIC AMINES CHEVRON RESEARCH AND TECHNOLOGY COMPANY (US) 1994-07-07 WO disclosed
EP-0400657-A2 Process for developing of ps plates requiring no dampening water Fuji Photo Film Co., Ltd. (JP) 1990-12-05 EP disclosed
CN-1047495-A New sequestrant and application thereof PROCETER & GAMBLE CO (US) 1990-12-05 CN disclosed
US-4431514-A HEATING OR COOLING A HYDROCARBON STREAM; ADDING AN HYDROXY CARBOXYLIC ACID-MODIFIED POLYALKYLENE AMINE CHEVRON RESEARCH COMPANY (US) 1984-02-14 US disclosed
EP-0010256-B1 PROCESS FOR PREPARING SYMMETRIC 1,3-DISUBSTITUTED UREAS BASF Aktiengesellschaft (DE) 1982-12-29 EP disclosed
US-4269790-A Hydrocarbylethyl sulfonyl fluoride CHEVRON RESEARCH COMPANY (US) 1981-05-26 US disclosed
EP-0010256-A2 Process for preparing symmetric 1,3-disubstituted ureas BASF Aktiengesellschaft (DE) 1980-04-30 EP disclosed
US-4200518-A POLYALKYLENE-AMINES, CRUDE OILS CHEVRON RESEARCH COMPANY (US) 1980-04-29 US disclosed
US-4166726-A Diesel fuel containing polyalkylene amine and Mannich base CHEVRON RESEARCH COMPANY (US) 1979-09-04 US disclosed
US-4153633-A HYDROLYSIS RHODIA, INC. (US) 1979-05-08 US disclosed
US-4153634-A HYDROLYTIC CRACKING RHODIA, INC. (US) 1979-05-08 US disclosed
US-4122266-A TO FORM LUBRICATING OIL ADDITIVES CHEVRON RESEARCH COMPANY (US) 1978-10-24 US disclosed
US-4122266-A TO FORM LUBRICATING OIL ADDITIVES CHEVRON RESEARCH COMPANY (US) 1978-10-24 US disclosed