Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRB2 | P07550 | 1/20 | 0.42 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.42 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.42 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.40 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.34 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | LAP3 | P28838 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.31 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.31 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7617286 | 0.91 | DNM1 (0.52) | DNM1OPRM1CA1CA2SPHK1 | |
| SCHEMBL10521005 | 0.88 | OPRM1 (0.48) | ADRB2ADRB1ADRB3DNM1OPRM1 | |
| SCHEMBL5671464 | 0.87 | OPRM1 (0.32) | DNM1OPRM1CA1CA2 | |
| SCHEMBL10820855 | 0.86 | DNM1 (0.47) | ADRB2ADRB1ADRB3DNM1OPRM1 | |
| SCHEMBL3492554 | 0.86 | DNM1 (0.42) | ADRB2ADRB1ADRB3DNM1OPRM1 | |
| SCHEMBL27642047 | 0.86 | DNM1 (0.47) | ADRB2ADRB1ADRB3DNM1OPRM1 | |
| SCHEMBL308919 | 0.84 | — | — | |
| SCHEMBL8070740 | 0.83 | DNM1 (0.31) | ADRB2ADRB1ADRB3DNM1 | |
| SCHEMBL309212 | 0.82 | — | — | |
| SCHEMBL5671681 | 0.82 | OPRM1 (0.40) | ADRB2ADRB1ADRB3DNM1OPRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2257669-B1 | IONIC LIQUID SYSTEMS FOR THE PROCESSING OF BIOMASS, THEIR COMPONENTS AND/OR DERIVATIVES, AND MIXTURES THEREOF | UNIV ALABAMA (US) | 2017-03-22 | — | — | EP | claimed |
| US-8668807-B2 | Ionic liquid systems for the processing of biomass, their components and/or derivatives, and mixtures thereof | BOARD OF TRUSTEES OF THE UNIVERSITY OF ALABAMA (US) | 2014-03-11 | — | — | US | claimed |
| US-20100319862-A1 | IONIC LIQUID SYSTEMS FOR THE PROCESSING OF BIOMASS, THEIR COMPONENTS AND/OR DERIVATIVES, AND MIXTURES THEREOF | THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ALABAMA (US) | 2010-12-23 | — | — | US | claimed |
| EP-2257669-A1 | IONIC LIQUID SYSTEMS FOR THE PROCESSING OF BIOMASS, THEIR COMPONENTS AND/OR DERIVATIVES, AND MIXTURES THEREOF | The Board Of Trustees Of The University Of Alabama (US) | 2010-12-08 | — | — | EP | claimed |
| WO-2009105236-A1 | IONIC LIQUID SYSTEMS FOR THE PROCESSING OF BIOMASS, THEIR COMPONENTS AND/OR DERIVATIVES, AND MIXTURES THEREOF | THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ALABAMA (US) | 2009-08-27 | — | — | WO | claimed |
| CN-108699694-B | Electroless plating base agent comprising highly branched polymer and metal fine particles | 日产化学株式会社 | 2021-03-12 | — | — | CN | disclosed |
| US-10920179-B2 | Cleaning solution and method for cleaning substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| CN-107532302-B | Photonasty electroless plating substrate agent | 日产化学工业株式会社 | 2019-10-08 | — | — | CN | disclosed |
| US-20190256805-A1 | CLEANING SOLUTION AND METHOD FOR CLEANING SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-08-22 | — | — | US | disclosed |
| US-10119103-B2 | Cleaning liquid and method for cleaning | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-11-06 | — | — | US | disclosed |
| CN-108699694-A | Include the electroless plating substrate agent of highly -branched macromolecule and metal particle | 日产化学株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-107532302-A | Photonasty electroless plating substrate agent | 日产化学工业株式会社 | 2018-01-02 | — | — | CN | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| WO-1988003544-A1 | AMIDE MODIFIED EPOXY RESINS | THE DOW CHEMICAL COMPANY (US) | 1988-05-19 | — | — | WO | disclosed |
| EP-0266694-A2 | Amide modified epoxy resins | THE DOW CHEMICAL COMPANY (US) | 1988-05-11 | — | — | EP | disclosed |
| US-4721742-A | Amide modified epoxy resins from a dialkanolamine, a monoalkanolamine, an anhydride and (an) unsaturated monomer(s) | THE DOW CHEMICAL COMPANY (US) | 1988-01-26 | — | — | US | disclosed |
| US-4609747-A | Novel water-soluble antimony compounds and their preparation | ATLANTIC RICHFIELD (US) | 1986-09-02 | — | — | US | disclosed |
| US-4153634-A | HYDROLYTIC CRACKING | RHODIA, INC. (US) | 1979-05-08 | — | — | US | disclosed |
| US-4153633-A | HYDROLYSIS | RHODIA, INC. (US) | 1979-05-08 | — | — | US | disclosed |