SCHEMBL3095989

SCHEMBL3095989

Nc1ccc(Oc2ccccc2C2(c3ccccc3Oc3ccc(N)cc3)CCCCC2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NCOA1 Q15788 1/20 0.46
NCOA3 Q9Y6Q9 1/20 0.46
ALDH1A1 P00352 5/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
MAOA P21397 2/20 0.44
TDP1 Q9NUW8 2/20 0.41
CYP3A4 P08684 1/20 0.41
TSHR P16473 1/20 0.41
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
MAPT P10636 3/20 0.38
MITF O75030 1/20 0.38
GAA P10253 1/20 0.38
GFER P55789 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
NLRP1 Q9C000 1/20 0.38
NOD2 Q9HC29 1/20 0.38
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38
NLRP3 Q96P20 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8468197 0.84 NCOA1 (0.47) NCOA1NCOA3ALDH1A1L3MBTL1MAOA
SCHEMBL8468975 0.81 SLC6A3 (0.41) NCOA1NCOA3ALDH1A1L3MBTL1MAOA
SCHEMBL8578739 0.79 NCOA1 (0.39) NCOA1NCOA3ALDH1A1L3MBTL1MAOA
SCHEMBL8579676 0.77 NCOA1 (0.38) NCOA1NCOA3MAOAMEN1KMT2A
SCHEMBL8578783 0.76 CNR1 (0.37) NCOA1NCOA3MAOALTA4H
SCHEMBL8468641 0.75 CNR1 (0.38) NCOA1NCOA3LTA4H
SCHEMBL8578762 0.75 CNR1 (0.38) NCOA1NCOA3LTA4H
SCHEMBL8575963 0.75 CNR1 (0.38) NCOA1NCOA3LTA4H
SCHEMBL3095981 0.74 ALDH1A1 (0.50) NCOA1NCOA3ALDH1A1L3MBTL1TDP1
SCHEMBL1270920 0.74 MAOA (0.68) NCOA1NCOA3ALDH1A1L3MBTL1MAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8257901-B2 Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same LG CHEM, LTD. (KR) 2012-09-04 US claimed
US-10643916-B2 Conductive line system and process TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2020-05-05 US disclosed
US-20190252283-A1 Conductive Line System and Process TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2019-08-15 US disclosed
US-10269675-B2 Conductive line system and process TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2019-04-23 US disclosed
US-20180108590-A1 Conductive Line System and Process TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2018-04-19 US disclosed
US-9842790-B2 Conductive line system and process TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2017-12-12 US disclosed
US-20160293511-A1 Conductive Line System and Process TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2016-10-06 US disclosed
US-9368402-B2 Conductive line system and process TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2016-06-14 US disclosed
US-20150364369-A1 Conductive Line System and Process TAIWAN SEMICONDUCTOR MFG (TW) 2015-12-17 US disclosed
US-9117881-B2 Conductive line system and process TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2015-08-25 US disclosed
US-20140264863-A1 Conductive Line System and Process TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2014-09-18 US disclosed
US-8669038-B2 Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same LG CHEM, LTD. (KR) 2014-03-11 US disclosed
US-20120301826-A1 POLYIMIDE-BASED POLYMERS, COPOLYMERS THEREOF AND POSITIVE TYPE PHOTORESIST COMPOSITIONS COMPRISING THE SAME LG CHEM, LTD. (KP) 2012-11-29 US disclosed
US-8257901-B2 Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same LG CHEM, LTD. (KR) 2012-09-04 US disclosed
US-20100233618-A1 POLYIMIDE-BASED POLYMERS, COPOLYMERS THEREOF AND POSITIVE TYPE PHOTORESIST COMPOSITIONS COMPRISING THE SAME LG CHEM. LTD. (KR) 2010-09-16 US disclosed