Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17418143 | 0.77 | — | — | |
| SCHEMBL704817 | 0.75 | — | — | |
| SCHEMBL704251 | 0.73 | — | — | |
| SCHEMBL27818206 | 0.68 | ALOX15 (0.36) | ALDH1A1TSHRTDP1 | |
| SCHEMBL16965437 | 0.65 | ALDH1A1 (0.35) | ALDH1A1TSHRTDP1 | |
| SCHEMBL706798 | 0.64 | — | — | |
| SCHEMBL30290795 | 0.63 | ALDH1A1 (0.33) | ALDH1A1TSHRTDP1 | |
| SCHEMBL5668099 | 0.63 | DGAT1 (0.36) | ALDH1A1TSHRTDP1 | |
| SCHEMBL10396197 | 0.63 | TDP1 (0.33) | ALDH1A1TSHRTDP1 | |
| SCHEMBL3391288 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111534149-B | High-adhesion ink and preparation method thereof | 厦门欧化实业有限公司 | 2022-06-03 | — | — | CN | disclosed |
| CN-111534149-A | High-adhesion ink and preparation method thereof | 厦门欧化实业有限公司 | 2020-08-14 | — | — | CN | disclosed |
| US-9969850-B2 | Method for producing modified polymer, and rubber composition | TOYO TIRE & RUBBER CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20160009875-A1 | METHOD FOR PRODUCING MODIFIED POLYMER, AND RUBBER COMPOSITION | TOYO TIRE & RUBBER CO., LTD. (JP) | 2016-01-14 | — | — | US | disclosed |
| EP-2216682-B1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | ADEKA CORP (JP) | 2013-07-17 | — | — | EP | disclosed |
| US-8211619-B2 | Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist | ADEKA CORPORATION (JP) | 2012-07-03 | — | — | US | disclosed |
| US-20100273104-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | A D E K A (ADEKA CORPORATION) (JP) | 2010-10-28 | — | — | US | disclosed |
| EP-2216682-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | Adeka Corporation (JP) | 2010-08-11 | — | — | EP | disclosed |