⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL947078 | 1.00 | — | — | |
| Fluoride SCHEMBL1633223 | 1.00 | — | — | |
| Fluoride SCHEMBL56508 | 1.00 | — | — | |
| Fluoride SCHEMBL27273 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL11898253 | 1.00 | — | — | |
| Fluoride SCHEMBL155068 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL3432542 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL2794579 | 1.00 | — | — | |
| Fluoride SCHEMBL6443670 | 0.82 | — | — | |
| Fluoride SCHEMBL10322495 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113113302-B | Etching method and etching equipment | 武汉光迅科技股份有限公司 | 2024-05-03 | — | — | CN | claimed |
| CN-113113302-B | Etching method and etching equipment | 武汉光迅科技股份有限公司 | 2024-05-03 | — | — | CN | disclosed |
| CN-116504715-A | Manufacturing method of metal interconnection structure | 华虹半导体(无锡)有限公司 | 2023-07-28 | — | — | CN | disclosed |
| US-20230183859-A1 | HYDROPHILIC ANTI FOG FILM LAYER, PREPARATION METHOD THEREFOR, AND APPLICATION AND PRODUCT THEREOF | JIANGSU FAVORED NANOTECHNOLOGY CO,, LTD. (CN) | 2023-06-15 | — | — | US | disclosed |
| CN-113968571-B | Preparation method of crosstalk-prevention self-limiting superfine closely-spaced crystalline silicon nanowire | 南京大学 | 2023-06-06 | — | — | CN | disclosed |
| CN-115910751-A | Novel treatment process for F PAD corrosion | 浙江美迪凯光学半导体有限公司 | 2023-04-04 | — | — | CN | disclosed |
| CN-111501015-B | Hydrophilic antifogging film layer, preparation method, application and product thereof | 江苏菲沃泰纳米科技股份有限公司 | 2022-08-19 | — | — | CN | disclosed |
| CN-111501015-A | Hydrophilic antifogging film layer, preparation method, application and product thereof | 江苏菲沃泰纳米科技有限公司 | 2020-08-07 | — | — | CN | disclosed |
| US-8600204-B2 | Optical control device | NEC CORPORATION (JP) | 2013-12-03 | — | — | US | disclosed |
| US-20120195565-A1 | OPTICAL CONTROL DEVICE | TOKUSHIMA MASATOSHI (JP) | 2012-08-02 | — | — | US | disclosed |
| US-8208776-B2 | Optical control device | NEC CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-7799673-B2 | Semiconductor device manufacturing method | KABUSHIKI KAISHA TOSHIBA (JP) | 2010-09-21 | — | — | US | disclosed |
| US-20100014821-A1 | OPTICAL CONTROL DEVICE | NEC CORPORATION (JP) | 2010-01-21 | — | — | US | disclosed |
| US-20080286961-A1 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD | KABUSHIKI KAISHA TOSHIBA (JP) | 2008-11-20 | — | — | US | disclosed |