⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL1633223 | 1.00 | — | — | |
| Fluoride SCHEMBL56508 | 1.00 | — | — | |
| Fluoride SCHEMBL3098074 | 1.00 | — | — | |
| Fluoride SCHEMBL27273 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL11898253 | 1.00 | — | — | |
| Fluoride SCHEMBL155068 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL3432542 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL2794579 | 1.00 | — | — | |
| Fluoride SCHEMBL6443670 | 0.82 | — | — | |
| Fluoride SCHEMBL10322495 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119976828-A | Multielement doped graphite composite material and preparation method and application thereof | 四川坤天新能源科技有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-119852356-A | Preparation method of silicon-carbon composite material and lithium ion battery containing composite material | 时代新能源投资(海南)合伙企业(有限合伙) | 2025-04-18 | — | — | CN | claimed |
| CN-119694441-A | Gas-sensitive sensing analysis method based on metal modified BN nanotube | 南方电网科学研究院有限责任公司 | 2025-03-25 | — | — | CN | claimed |
| CN-119517742-A | Etching method and device for photoresist morphology modification and semiconductor device | 西湖大学 | 2025-02-25 | — | — | CN | claimed |
| CN-118841537-A | Hard carbon composite material, preparation method thereof, negative plate and battery | 蜂巢能源科技(上饶)有限公司 | 2024-10-25 | — | — | CN | claimed |
| CN-118136798-A | Quick-charging anode material based on medium sulfur coke and preparation method thereof | 河北坤天新能源股份有限公司 | 2024-06-04 | — | — | CN | claimed |
| CN-117673353-A | Hard carbon composite material for sodium ion battery and preparation method thereof | 丰镇市宏升炭素有限公司 | 2024-03-08 | — | — | CN | claimed |
| CN-116470032-A | Preparation method of negative electrode material for energy storage lithium ion battery | 晖阳(贵州)新能源材料有限公司 | 2023-07-21 | — | — | CN | claimed |
| CN-116313781-A | Method for manufacturing semiconductor structure | 长鑫存储技术有限公司 | 2023-06-23 | — | — | CN | claimed |
| US-20110045253-A1 | CONTROL OF PROPERTIES OF PRINTED ELECTRODES IN AT LEAST TWO DIMENSIONS | MEDTRONIC, INC. (US) | 2011-02-24 | — | — | US | claimed |
| JP-2010539651-A | — | — | 2010-12-16 | — | — | JP | claimed |
| EP-2208246-A2 | CONTROL OF PROPERTIES OF PRINTED ELECTRODES IN AT LEAST TWO DIMENSIONS | Medtronic, Inc. (US) | 2010-07-21 | — | — | EP | claimed |
| WO-2009035488-A2 | CONTROL OF PROPERTIES OF PRINTED ELECTRODES IN AT LEAST TWO DIMENSIONS | MEDTRONIC, INC. (US) | 2009-03-19 | — | — | WO | claimed |
| US-5903622-A | Accelerator-based neutron source for boron neutron capture therapy (BNCT) and method | LOCKHEED MARTIN IDAHO TECHNOLOGIES COMPANY (US) | 1999-05-11 | — | — | US | claimed |
| JP-8306671-A | — | — | None | — | — | JP | disclosed |
| US-20260044070-A1 | METHOD OF REPAIRING PHOTOMASK | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-02-12 | — | — | US | disclosed |
| US-12347693-B2 | Plasma processing method and manufacturing method of semiconductor device | HITACHI HIGH-TECH CORPORATION (JP) | 2025-07-01 | — | — | US | disclosed |
| EP-0167136-B1 | SELECTIVE ANISOTROPIC REACTIVE ION ETCHING PROCESS FOR POLYSILICIDE COMPOSITE STRUCTURES | International Business Machines Corporation (US) | 1990-12-05 | — | — | EP | disclosed |
| EP-0167136-A2 | Selective anisotropic reactive ion etching process for polysilicide composite structures | International Business Machines Corporation (US) | 1986-01-08 | — | — | EP | disclosed |
| US-4528066-A | Selective anisotropic reactive ion etching process for polysilicide composite structures | IBM CORPORATION (US) | 1985-07-09 | — | — | US | disclosed |