SCHEMBL3102263

SCHEMBL3102263

C=CC(=O)OCCCOc1ccccc1O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.54
GAA P10253 4/20 0.53
JAK2 O60674 1/20 0.53
LMNA P02545 1/20 0.53
MAPT P10636 1/20 0.53
TSHR P16473 5/20 0.50
ALDH1A1 P00352 3/20 0.50
CYP3A4 P08684 1/20 0.50
TDP1 Q9NUW8 1/20 0.46
HPGD P15428 2/20 0.46
KDM4E B2RXH2 1/20 0.43
TP53 P04637 2/20 0.42
HIF1A Q16665 2/20 0.42
HSD17B10 Q99714 1/20 0.42
DRD2 P14416 1/20 0.41
DRD4 P21917 1/20 0.41
DRD3 P35462 1/20 0.41
LIG1 P18858 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
THRA P10827 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5694249 0.97 TSHR (0.55) THRBGAAJAK2LMNAMAPT
SCHEMBL29497668 0.95 TSHR (0.58) THRBGAAJAK2LMNAMAPT
SCHEMBL30053278 0.92 THRB (0.64) THRBGAAJAK2LMNAMAPT
SCHEMBL4577955 0.92 THRB (0.64) THRBGAAJAK2LMNAMAPT
Acrylic Acid SCHEMBL8549385 0.88 THRB (0.63) THRBGAAJAK2LMNAMAPT
SCHEMBL27459990 0.86 KMT2A (0.48) THRBGAAJAK2LMNAMAPT
SCHEMBL17036970 0.83 THRB (0.60) THRBGAAJAK2LMNAMAPT
SCHEMBL15911331 0.83 LMNA (0.57) THRBLMNAMAPTTSHRALDH1A1
SCHEMBL17036963 0.83 TDP1 (0.53) THRBLMNAMAPTTSHRALDH1A1
SCHEMBL10869836 0.83 ALDH1A1 (0.59) THRBLMNAMAPTTSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3067395-B1 ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER SEIKO EPSON CORP (JP) 2020-10-28 EP claimed
US-10392522-B2 Ultraviolet curable composition and recorded object SEIKO EPSON CORPORATION (JP) 2019-08-27 US claimed
EP-3067395-A1 ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER Seiko Epson Corporation (JP) 2016-09-14 EP claimed
US-20160257827-A1 ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT SEIKO EPSON CORPORATION (JP) 2016-09-08 US claimed
EP-2383314-B1 Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate FUJIFILM CORP (JP) 2012-12-26 EP claimed
US-4500629-A Method of forming images from liquid masses CIBA-GEIGY CORPORATION (US) 1985-02-19 US claimed
US-20230242696-A1 MAINTENANCE LIQUID AND MAINTENANCE METHOD SEIKO EPSON CORPORATION (JP) 2023-08-03 US disclosed
CN-113544120-A Novel compound, composition containing same, and cured product 株式会社ADEKA 2021-10-22 CN disclosed
CN-107207920-B Adhesive sheet for semiconductor processing 琳得科株式会社 2021-02-09 CN disclosed
EP-3067395-B1 ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER SEIKO EPSON CORP (JP) 2020-10-28 EP disclosed
WO-2020189066-A1 COATING COMPOSITION 株式会社大阪ソーダ 2020-09-24 WO disclosed
US-10392522-B2 Ultraviolet curable composition and recorded object SEIKO EPSON CORPORATION (JP) 2019-08-27 US disclosed
US-9588424-B2 Photosensitive resin composition for screen printing, photosensitive film, and screen plate SUNTYPE CO., LTD. (JP) 2017-03-07 US disclosed
WO-2006038727-A1 WATER-BASED INKS FOR INK-JET PRINTING KAO CORPORATION (JP) 2006-04-13 WO disclosed
US-6479153-B1 IMPREGNATING A FIBROUS SUBSTRATE, A MICROFINE FIBER-FORMING FIBER, WITH A THERMALLY GELLABLE COMPOSITE RESIN EMULSION OBTAINED BY EMULSION-POLYMERIZING AN ETHYLENICALLY UNSATURATED MONOMER IN THE PRESENCE OF A POLYURETHANE KURARAY CO., LTD. (JP) 2002-11-12 US disclosed
EP-0818515-B1 WATERBORNE PHOTOSENSITIVE RESIN COMPOSITION MACDERMID INC (US) 2002-11-06 EP disclosed
EP-0823460-B1 WATER-BASE PHOTOSENSITIVE RESIN COMPOSITION MACDERMID INC (US) 2002-08-14 EP disclosed
EP-0823460-A1 WATER-BASE PHOTOSENSITIVE RESIN COMPOSITION National Starch and Chemical Investment Holding Corporation (US) 1998-02-11 EP disclosed
EP-0818515-A1 WATER-BASE PHOTOSENSITIVE RESIN COMPOSITION National Starch and Chemical Investment Holding Corporation (US) 1998-01-14 EP disclosed
US-4500629-A Method of forming images from liquid masses CIBA-GEIGY CORPORATION (US) 1985-02-19 US disclosed