SCHEMBL31025596

SCHEMBL31025596

O=c1oc(=O)c2cc3cc(c2)c(=O)oc(=O)c2cc1cc(c2)c(=O)oc3=O

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR35 Q9HC97 5/20 0.34
NQO1 P15559 1/20 0.33
TYR P14679 1/20 0.32
DAO P14920 1/20 0.32
AKR1B1 P15121 1/20 0.32
HPGD P15428 1/20 0.32
POLB P06746 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
MAOB P27338 2/20 0.31
KDM4E B2RXH2 2/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2A6 P11509 1/20 0.31
CYP2C9 P11712 1/20 0.31
NFKB1 P19838 1/20 0.31
MAOA P21397 1/20 0.31
ACHE P22303 1/20 0.31
CYP2C19 P33261 1/20 0.31
HSD17B10 Q99714 1/20 0.31
PTGES O14684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21173933 0.81 HSD17B10 (0.35) TYRDAOAKR1B1HPGDPOLB
SCHEMBL110031 0.77 MCL1 (0.38) TYRDAOAKR1B1HPGDPOLB
SCHEMBL7002418 0.76 ELANE (0.38) GPR35AKR1B1HPGDPOLBSMN1; SMN2
SCHEMBL11577451 0.74 MCL1 (0.36) TYRDAOAKR1B1HPGDPOLB
SCHEMBL8520516 0.74 MCL1 (0.36) TYRDAOAKR1B1HPGDPOLB
SCHEMBL5146405 0.72 ELANE (0.39) GPR35AKR1B1HPGDPOLBSMN1; SMN2
SCHEMBL21173972 0.69 TDP1 (0.33) AKR1B1HPGDPOLBSMN1; SMN2KDM4E
SCHEMBL15763 0.69 CYP1A2 (0.43) GPR35NQO1AKR1B1HPGDPOLB
SCHEMBL17456072 0.67 CYP1A2 (0.42) GPR35NQO1AKR1B1HPGDPOLB
SCHEMBL25994740 0.67 CYP1A2 (0.42) GPR35NQO1AKR1B1HPGDPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118973347-A Method for manufacturing patterned film substrate 中央硝子株式会社 2024-11-15 CN disclosed
CN-118945925-A Method for producing patterned film substrate, and fluorocopolymer 中央硝子株式会社 2024-11-12 CN disclosed
CN-112219451-B Method for producing patterned film substrate, and fluorocopolymer 中央硝子株式会社 2024-08-23 CN disclosed
CN-112205077-B Method for manufacturing patterned film substrate 中央硝子株式会社 2024-07-26 CN disclosed