Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | CNR2 | P34972 | 1/20 | 0.33 |
| ▸ | PTGES | O14684 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3092239 | 0.83 | GRIA1 (0.33) | — | |
| SCHEMBL3098822 | 0.83 | RELA (0.40) | MEN1KMT2ALMNAMAPTCA1 | |
| SCHEMBL3091183 | 0.83 | ALDH1A1 (0.33) | MAPTCA1 | |
| SCHEMBL3087040 | 0.82 | — | — | |
| SCHEMBL3097970 | 0.81 | SMN1; SMN2 (0.41) | MEN1KMT2ASMN1; SMN2PTGESLMNA | |
| SCHEMBL3097896 | 0.81 | RELA (0.44) | SMN1; SMN2LMNA | |
| SCHEMBL3106483 | 0.81 | RELA (0.48) | CA1 | |
| SCHEMBL3096753 | 0.79 | NLRP3 (0.36) | — | |
| SCHEMBL3095224 | 0.78 | HPGD (0.54) | MEN1KMT2AMAPTCA1 | |
| SCHEMBL3109002 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9170492-B2 | Silicon-containing film-forming composition, silicon-containing film, and pattern forming method | JSR CORPORATION (JP) | 2015-10-27 | — | — | US | disclosed |
| US-9140985-B2 | — | — | 2015-09-22 | — | — | US | disclosed |
| US-20100233632-A1 | SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2010-09-16 | — | — | US | disclosed |