SCHEMBL3107619

SCHEMBL3107619

CO[SiH](OC)C(C)(C)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.46
ALDH1A1 P00352 3/20 0.43
ALOX15 P16050 1/20 0.43
KCNN4 O15554 4/20 0.39
CYP2C19 P33261 1/20 0.39
HIF1A Q16665 1/20 0.39
TAAR1 Q96RJ0 1/20 0.38
ESR1 P03372 2/20 0.37
ESR2 Q92731 2/20 0.37
CYP3A4 P08684 1/20 0.37
MAPT P10636 1/20 0.35
KMT2A Q03164 1/20 0.35
CES1 P23141 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
TSHR P16473 2/20 0.35
CA4 P22748 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28716149 0.81 MAPK1 (0.46) MAPK1ALDH1A1ALOX15KCNN4CYP2C19
SCHEMBL707427 0.79 MAPK1 (0.44) MAPK1ALDH1A1ALOX15KCNN4CYP2C19
SCHEMBL8322042 0.78 MAPK1 (0.42) MAPK1ALDH1A1ALOX15KCNN4TAAR1
SCHEMBL5408231 0.78 MAPK1 (0.42) MAPK1ALDH1A1ALOX15KCNN4TAAR1
SCHEMBL20658041 0.74 MAPK1 (0.39) MAPK1ALDH1A1ALOX15KCNN4TAAR1
SCHEMBL2532155 0.72 MAPK1 (0.46) MAPK1ALDH1A1ALOX15KCNN4CYP2C19
SCHEMBL22730218 0.72 MAPK1 (0.46) MAPK1ALDH1A1ALOX15KCNN4CYP2C19
SCHEMBL20658075 0.71 KCNN4 (0.38) MAPK1ALDH1A1ALOX15KCNN4TAAR1
SCHEMBL10692727 0.70 MAPK1 (0.44) MAPK1ALDH1A1ALOX15KCNN4CYP2C19
SCHEMBL22730227 0.68 MAPK1 (0.42) MAPK1ALDH1A1ALOX15KCNN4CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP claimed
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP disclosed
US-8211619-B2 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORPORATION (JP) 2012-07-03 US disclosed
US-20100273104-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST A D E K A (ADEKA CORPORATION) (JP) 2010-10-28 US disclosed
EP-2216682-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST Adeka Corporation (JP) 2010-08-11 EP disclosed
EP-0693524-B1 Polypropylene resin and film prepared therefrom IDEMITSU PETROCHEMICAL CO (JP) 1998-06-10 EP disclosed
EP-0693524-A1 Polypropylene resin and film prepared therefrom IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1996-01-24 EP disclosed