SCHEMBL31079541

SCHEMBL31079541

C[N+](C)(C)Cc1ccccc1.C[N+](C)(C)Cc1ccccc1.O=C([O-])C(F)(F)S(=O)(=O)[O-]

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.49
KDM4E B2RXH2 1/20 0.49
TDP1 Q9NUW8 1/20 0.49
ALPL P05186 1/20 0.40
POLB P06746 1/20 0.40
ALPG P10696 1/20 0.40
CES1 P23141 2/20 0.37
MAPT P10636 1/20 0.36
TSHR P16473 1/20 0.36
HSD17B10 Q99714 1/20 0.36
CES2 O00748 1/20 0.34
GPR3 P46089 1/20 0.34
HSD11B1 P28845 2/20 0.34
SMN1; SMN2 Q16637 1/20 0.33
HIF1A Q16665 1/20 0.33
PRMT1 Q99873 1/20 0.33
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA9 Q16790 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31079505 0.90 ALDH1A1 (0.50) ALDH1A1KDM4ETDP1ALPLPOLB
Trifluoroacetic Acid SCHEMBL1130240 0.84 KDM4E (0.59) ALDH1A1KDM4ETDP1ALPLPOLB
Trifluoromethanesulfonic Acid SCHEMBL1130292 0.84 KDM4E (0.59) ALDH1A1KDM4ETDP1GPR3CA12
SCHEMBL1003378 0.81 ALDH1A1 (0.50) ALDH1A1KDM4ETDP1ALPLPOLB
Pivalate SCHEMBL23069472 0.79 ALDH1A1 (0.61) ALDH1A1KDM4ETDP1ALPLPOLB
Sulfuric Acid SCHEMBL229801 0.79 KDM4E (0.65) ALDH1A1KDM4ETDP1ALPLPOLB
Bicarbonate SCHEMBL988121 0.79 ALDH1A1 (0.71) ALDH1A1KDM4ETDP1ALPLPOLB
Sulfuric Acid SCHEMBL229799 0.79 KDM4E (0.71) ALDH1A1KDM4ETDP1ALPLPOLB
Bicarbonate SCHEMBL988119 0.79 ALDH1A1 (0.71) ALDH1A1KDM4ETDP1ALPLPOLB
Trichloroacetic Acid SCHEMBL5874537 0.78 ALDH1A1 (0.59) ALDH1A1KDM4ETDP1ALPLPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024176672-A1 RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD JSR株式会社 2024-08-29 WO disclosed