Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | GPR3 | P46089 | 1/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.34 |
| ▸ | ALPL | P05186 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | ALPG | P10696 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | FAAH | O00519 | 1/20 | 0.33 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.33 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.33 |
| ▸ | ELANE | P08246 | 1/20 | 0.33 |
| ▸ | PRTN3 | P24158 | 1/20 | 0.33 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.33 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.33 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1003379 | 0.86 | ALDH1A1 (0.52) | ALDH1A1KDM4ETDP1HSD11B1CES1 | |
| Trifluoromethanesulfonic Acid SCHEMBL1130292 | 0.85 | KDM4E (0.59) | ALDH1A1KDM4ETDP1GPR3FAAH | |
| SCHEMBL31079505 | 0.82 | ALDH1A1 (0.50) | ALDH1A1KDM4ETDP1GPR3HSD11B1 | |
| SCHEMBL31079541 | 0.81 | ALDH1A1 (0.49) | ALDH1A1KDM4ETDP1GPR3HSD11B1 | |
| Sulfuric Acid SCHEMBL229801 | 0.80 | KDM4E (0.65) | ALDH1A1KDM4ETDP1CES1ALPL | |
| Sulfuric Acid SCHEMBL229799 | 0.80 | KDM4E (0.71) | ALDH1A1KDM4ETDP1ALPLPOLB | |
| SCHEMBL16195176 | 0.79 | ALDH1A1 (0.44) | ALDH1A1KDM4ETDP1GPR3MEN1 | |
| Trifluoromethanesulfonic Acid SCHEMBL1130294 | 0.79 | ALDH1A1 (0.59) | ALDH1A1KDM4ETDP1HSD11B1CES1 | |
| SCHEMBL1001524 | 0.79 | KDM4E (0.41) | ALDH1A1KDM4ETDP1HSD11B1TSHR | |
| SCHEMBL2131788 | 0.78 | ALDH1A1 (0.46) | ALDH1A1KDM4ETDP1GPR3HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119330920-A | Photoacid generator, resist composition and application thereof | 湖北鼎龙控股股份有限公司 | 2025-01-21 | — | — | CN | disclosed |
| US-20240295814-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-09-05 | — | — | US | disclosed |
| WO-2024176672-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD | JSR株式会社 | 2024-08-29 | — | — | WO | disclosed |
| US-11953827-B2 | Molecular resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-09 | — | — | US | disclosed |
| CN-111793054-B | Sulfonium compound, chemically amplified resist composition, and pattern forming method | 信越化学工业株式会社 | 2023-07-07 | — | — | CN | disclosed |
| US-11687000-B2 | Sulfonium compound, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-27 | — | — | US | disclosed |
| US-11560355-B2 | Onium salt, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-24 | — | — | US | disclosed |
| US-20200379345-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-12-03 | — | — | US | disclosed |
| CN-111793054-A | Sulfonium compound, chemically amplified resist composition, and pattern forming method | 信越化学工业株式会社 | 2020-10-20 | — | — | CN | disclosed |
| US-20200319550-A1 | SULFONIUM COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-08 | — | — | US | disclosed |
| US-20200223796-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-16 | — | — | US | disclosed |
| US-9164384-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-20140322650-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-30 | — | — | US | disclosed |
| US-8173354-B2 | Sulfonium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20110008735-A1 | SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11560355-B2 | Onium salt, chemically amplified resist composition, and patterning process | ARF5, EIF2B5, EIF2B3 | ALDH1A1 3553/4885KDM4E 760/4885TDP1 3307/4885 |
| US-20200223796-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | ARF5, EIF2B5, EIF2B3 | ALDH1A1 3553/4885KDM4E 760/4885TDP1 3307/4885 |
| US-11687000-B2 | Sulfonium compound, chemically amplified resist composition, and patterning process | ETV6, PKD1, PKD2 | ALDH1A1 3150/4885KDM4E 1025/4885TDP1 3997/4885 |
| US-20110008735-A1 | SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | ETV6, ETV1, VPS4B | ALDH1A1 4625/4885KDM4E 1943/4885TDP1 2411/4885 |
| US-20200319550-A1 | SULFONIUM COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | ETV6, PKD1, PKD2 | ALDH1A1 3150/4885KDM4E 1025/4885TDP1 3997/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.