SCHEMBL3109934

SCHEMBL3109934

CCCCS(=O)(=O)NCC[Si](OC)(OC)OC

nearest known ligand 0.41

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
RELA Q04206 4/20 0.41
CCR4 P51679 1/20 0.40
CA2 P00918 3/20 0.36
CA12 O43570 3/20 0.36
CA14 Q9ULX7 3/20 0.36
HPGD P15428 3/20 0.36
CA1 P00915 2/20 0.36
CA7 P43166 2/20 0.36
ALDH1A1 P00352 2/20 0.36
KDM4E B2RXH2 2/20 0.36
GAA P10253 1/20 0.36
MAPT P10636 1/20 0.36
LMNA P02545 2/20 0.36
CA9 Q16790 1/20 0.33
PPARA Q07869 2/20 0.32
EPHX1 P07099 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3096564 0.93 RELA (0.49) RELACCR4CA2CA12CA14
SCHEMBL3098822 0.84 RELA (0.40) RELACCR4CA2CA12CA14
SCHEMBL3103562 0.84 RELA (0.43) RELAALDH1A1LMNA
SCHEMBL3097970 0.83 SMN1; SMN2 (0.41) HPGDCA1ALDH1A1KDM4EMAPT
SCHEMBL16015210 0.81 RELA (0.36) RELACCR4CA2CA12CA14
SCHEMBL3106743 0.79 NLRP3 (0.38)
SCHEMBL3106483 0.78 RELA (0.48) RELACA2HPGDCA1KDM4E
SCHEMBL1446467 0.77 RELA (0.47) RELACCR4CA2CA12CA14
SCHEMBL608990 0.76 CA1 (0.61) RELACA2CA12CA14HPGD
SCHEMBL5689488 0.76 CA1 (0.52) RELACA2CA12CA14HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9170492-B2 Silicon-containing film-forming composition, silicon-containing film, and pattern forming method JSR CORPORATION (JP) 2015-10-27 US disclosed
US-9140985-B2 2015-09-22 US disclosed
US-20100233632-A1 SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD JSR CORPORATION (JP) 2010-09-16 US disclosed