⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8396285 | 0.83 | KAT2A (0.39) | — | |
| SCHEMBL17718036 | 0.82 | OPRM1 (0.33) | — | |
| SCHEMBL8394086 | 0.80 | CYP1A2 (0.42) | — | |
| SCHEMBL7153568 | 0.79 | CYP1A2 (0.49) | — | |
| SCHEMBL19039714 | 0.79 | PTPN1 (0.34) | — | |
| SCHEMBL4176756 | 0.78 | — | — | |
| SCHEMBL16453954 | 0.78 | — | — | |
| SCHEMBL8398148 | 0.78 | OPRM1 (0.32) | — | |
| SCHEMBL19039715 | 0.78 | MAOA (0.41) | — | |
| SCHEMBL8397501 | 0.78 | VDR (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12043781-B2 | Liquid-crystalline medium | MERCK PATENT GMBH (DE) | 2024-07-23 | — | — | US | disclosed |
| US-20240067879-A1 | Liquid-crystal medium | MERCK PATENT GMBH (DE) | 2024-02-29 | — | — | US | disclosed |
| US-11873438-B2 | Liquid-crystal medium | MERCK PATENT GMBH (DE) | 2024-01-16 | — | — | US | disclosed |
| US-11873439-B2 | Polymerisable liquid crystal material and polymerised liquid crystal film | MERCK PATENT GMBH (DE) | 2024-01-16 | — | — | US | disclosed |
| US-11820932-B2 | Polymerisable liquid crystal material and polymerised liquid crystal film | MERCK PATENT GMBH (DE) | 2023-11-21 | — | — | US | disclosed |
| US-20230357637-A1 | LIQUID-CRYSTAL MEDIUM | MERCK PATENT GMBH (DE) | 2023-11-09 | — | — | US | disclosed |
| US-11802243-B2 | Liquid-crystal medium | MERCK PATENT GMBH (DE) | 2023-10-31 | — | — | US | disclosed |
| US-20230340328-A1 | LIQUID-CRYSTALLINE MEDIUM | MERCK PATENT GMBH (DE) | 2023-10-26 | — | — | US | disclosed |
| US-20230340329-A1 | POLYMERIZABLE LIQUID CRYSTAL MATERIAL AND POLYMERIZED LIQUID CRYSTAL FILM | MERCK PATENT GMBH (DE) | 2023-10-26 | — | — | US | disclosed |
| US-11795399-B2 | UV curable adhesion promoters based on functionalised polyvinyl alcohols | MERCK PATENT GMBH (DE) | 2023-10-24 | — | — | US | disclosed |
| US-20050113538-A1 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern | MITSUBISHI RAYON CO.,LTD. (JP) | 2005-05-26 | — | — | US | disclosed |
| US-20040248031-A1 | 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-12-09 | — | — | US | disclosed |
| EP-1447403-A1 | 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS | Mitsubishi Rayon Co., Ltd. (JP) | 2004-08-18 | — | — | EP | disclosed |
| US-20040063882-A1 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-04-01 | — | — | US | disclosed |
| EP-1352904-A1 | (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS | Mitsubishi Rayon Co., Ltd. (JP) | 2003-10-15 | — | — | EP | disclosed |
| US-20030148214-A1 | Resins for resists and chemically amplifiable resist compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-08-07 | — | — | US | disclosed |
| EP-1304340-A1 | RESINS FOR RESISTS AND CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS | Mitsubishi Rayon Co., Ltd. (JP) | 2003-04-23 | — | — | EP | disclosed |
| EP-0722960-B1 | Copolymers for preparing cast glass, or molding materials for preparing heat stable shaped articles | AGOMER GES MIT BESCHRAENKTER H (DE) | 1999-06-02 | — | — | EP | disclosed |
| US-5880235-A | POLYMER PREPARED BY COPOLYMERIZING ALPHA-METHYLENE-GAMMA-BUTYROLACTONE AND VINYLICALLY UNSATURATED MONOMER | AGOMER GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1999-03-09 | — | — | US | disclosed |
| EP-0722960-A2 | Copolymers for preparing cast glass, or molding materials for preparing heat stable shaped articles | Degussa Aktiengesellschaft (DE) | 1996-07-24 | — | — | EP | disclosed |