Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL480723 | 0.89 | ALDH1A1 (0.44) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| SCHEMBL6430798 | 0.87 | ALDH1A1 (0.54) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| Bicarbonate SCHEMBL19178452 | 0.83 | ALDH1A1 (0.39) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| SCHEMBL23256373 | 0.78 | TSHR (0.52) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| Acrylic Acid SCHEMBL14658772 | 0.77 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL13065212 | 0.76 | ALDH1A1 (0.57) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| SCHEMBL1192277 | 0.71 | ALDH1A1 (0.61) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| SCHEMBL13898344 | 0.69 | ALDH1A1 (0.58) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| SCHEMBL27895579 | 0.69 | — | — | |
| SCHEMBL19971982 | 0.68 | ALDH1A1 (0.47) | ALDH1A1TSHRMAPK1TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230350293-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-11-02 | — | — | US | claimed |
| EP-4220301-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | Young Chang Chemical Co., Ltd. (KR) | 2023-08-02 | — | — | EP | claimed |
| CN-107924124-A | Negative photoresist composition for I-line with excellent etching resistance | 荣昌化学制品株式会社 | 2018-04-17 | — | — | CN | claimed |
| CN-107850841-A | Negative photoresist composition for KrF laser for forming semiconductor pattern | 荣昌化学制品株式会社 | 2018-03-27 | — | — | CN | claimed |
| EP-2578649-B1 | COMPOSITION FOR THE PRODUCTION OF A COATING COMPRISING HIGH ADHESION AND SCRATCH RESISTANCE | ZEISS CARL VISION INT GMBH (DE) | 2016-03-30 | — | — | EP | claimed |
| US-20230350293-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-11-02 | — | — | US | disclosed |
| EP-4220301-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | Young Chang Chemical Co., Ltd. (KR) | 2023-08-02 | — | — | EP | disclosed |
| EP-3960718-A1 | MORTAR SYSTEM | Hilti Aktiengesellschaft (LI) | 2022-03-02 | — | — | EP | disclosed |
| CN-109073973-A | KrF laser negative photoresist composition with high-resolution and high aspect ratio | 荣昌化学制品株式会社 | 2018-12-21 | — | — | CN | disclosed |
| CN-107924124-A | Negative photoresist composition for I-line with excellent etching resistance | 荣昌化学制品株式会社 | 2018-04-17 | — | — | CN | disclosed |
| CN-107850841-A | Negative photoresist composition for KrF laser for forming semiconductor pattern | 荣昌化学制品株式会社 | 2018-03-27 | — | — | CN | disclosed |
| EP-1205814-B1 | Electrophotographic carrier, developer using the same, and its use for developing electrostatic images | DAINIPPON INK & CHEMICALS (JP) | 2010-07-14 | — | — | EP | disclosed |
| US-6653040-B2 | An electrophotographic carrier obtained by coating magnetic particles (ferrite) with a silicon resin | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2003-11-25 | — | — | US | disclosed |
| US-20020081514-A1 | Electrophotographic carrier, developer using the same, and developing method | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2002-06-27 | — | — | US | disclosed |
| EP-1205814-A1 | Electrophotographic carrier, developer using the same, and developing method | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2002-05-15 | — | — | EP | disclosed |