SCHEMBL480723

SCHEMBL480723

OCCCC(CO)(CO)OCC1CO1

nearest known ligand 0.44

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.44
TSHR P16473 2/20 0.36
MAPK1 P28482 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
TP53 P04637 1/20 0.30
CYP3A4 P08684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL19178452 0.93 ALDH1A1 (0.39) ALDH1A1TSHRMAPK1TP53CYP3A4
SCHEMBL3124072 0.89 ALDH1A1 (0.47) ALDH1A1TSHRMAPK1SMN1; SMN2TP53
Acrylic Acid SCHEMBL14658772 0.87 ALDH1A1 (0.34) ALDH1A1
SCHEMBL6430798 0.84 ALDH1A1 (0.54) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
SCHEMBL23256373 0.76 TSHR (0.52) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
1,4-Butanediol SCHEMBL28947004 0.73 TSHR (0.58) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
1,4-Butanediol SCHEMBL28947007 0.73 TSHR (0.58) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
1,4-Butanediol SCHEMBL29288525 0.73 TSHR (0.58) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
1,4-Butanediol SCHEMBL21271 0.73 TSHR (0.58) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
SCHEMBL20543293 0.71 TSHR (0.56) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 170 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3660069-B1 FAST CURING EPOXY SYSTEMS EVONIK OPERATIONS GMBH (DE) 2024-01-03 EP claimed
EP-3569632-B1 FAST CURING EPOXY SYSTEMS EVONIK OPERATIONS GMBH (DE) 2023-12-06 EP claimed
US-20230350293-A1 I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN YOUNG CHANG CHEMICAL CO., LTD (KR) 2023-11-02 US claimed
EP-4065628-B1 EPOXY-DERIVED COVALENT ADAPTABLE NETWORKS AND METHODS OF THEIR PRODUCTION UNIV GENT (BE) 2023-10-25 EP claimed
EP-4220301-A1 I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN Young Chang Chemical Co., Ltd. (KR) 2023-08-02 EP claimed
WO-2022065713-A1 I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN 영창케미칼 주식회사 2022-03-31 WO claimed
EP-3345978-B1 HYBRID ADHESIVE AND ITS USE FISCHERWERKE GMBH & CO KG (DE) 2020-06-03 EP claimed
CN-109154776-A Chemical amplifying type negative photoresist composition 荣昌化学制品株式会社 2019-01-04 CN claimed
CN-107924124-A Negative photoresist composition for I-line with excellent etching resistance 荣昌化学制品株式会社 2018-04-17 CN claimed
CN-107850841-A Negative photoresist composition for KrF laser for forming semiconductor pattern 荣昌化学制品株式会社 2018-03-27 CN claimed
EP-2578649-B1 COMPOSITION FOR THE PRODUCTION OF A COATING COMPRISING HIGH ADHESION AND SCRATCH RESISTANCE ZEISS CARL VISION INT GMBH (DE) 2016-03-30 EP claimed
EP-2480591-B1 ALKOXYLATED CYCLIC DIAMINES AND USE THEREOF AS EMULSION BREAKERS CLARIANT FINANCE BV LTD (VG) 2013-11-06 EP claimed
WO-2012085120-A2 USE OF THIOCARBONATES IN EPOXY RESIN FORMULATIONS FOR SURFACE IMPROVEMENT SIKA TECHNOLOGY AG (CH) 2012-06-28 WO claimed
EP-2468791-A1 Use of thiocarbonates in formulations based on epoxide resins for enhancement of surfaces Sika Technology AG (CH) 2012-06-27 EP claimed
EP-2084200-B1 DERIVATIZED SOLID EPOXY RESIN AND USES THEREOF SIKA TECHNOLOGY AG (CH) 2009-12-30 EP claimed
EP-1118628-B1 Curable two-part epoxy mortar composition and its use HILTI AG (LI) 2004-08-18 EP claimed
EP-1118599-B1 By frontal polymerisation curable mortar and method of anchoring bars HILTI AG (LI) 2003-09-03 EP claimed
US-4525421-A POLYSILOXANES, POLYETHERS, POLYEDOXIDES, POLYETHERSILOXANES KABUSHIKI KAISHA SUWA SEIKOSHA (JP) 1985-06-25 US claimed
US-12313942-B2 Optical laminate and manufacturing method therefor, smart window comprising same, and vehicle and building windows and doors to which same are applied DONGWOO FINE-CHEM CO., LTD. (KR) 2025-05-27 US disclosed
US-4525421-A POLYSILOXANES, POLYETHERS, POLYEDOXIDES, POLYETHERSILOXANES KABUSHIKI KAISHA SUWA SEIKOSHA (JP) 1985-06-25 US disclosed