Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPRC | P08575 | 1/20 | 0.47 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.40 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.40 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 5/20 | 0.39 |
| ▸ | MEN1 | O00255 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | MAPK10 | P53779 | 1/20 | 0.39 |
| ▸ | PTK2B | Q14289 | 1/20 | 0.39 |
| ▸ | NCOA1 | Q15788 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | NCOA3 | Q9Y6Q9 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | CFTR | P13569 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15495742 | 1.00 | PTPRC (0.47) | PTPRCSLC6A2SLC6A4SLC6A3MAPT | |
| SCHEMBL5379907 | 0.82 | KMT2A (0.42) | MAPTMEN1KMT2ATSHRNPSR1 | |
| SCHEMBL5371317 | 0.80 | HSD17B10 (0.52) | MAPTMEN1KMT2ATSHRALDH1A1 | |
| SCHEMBL27901863 | 0.76 | KMT2A (0.36) | MAPTMEN1KMT2ATSHRALDH1A1 | |
| SCHEMBL13293021 | 0.76 | TSHR (0.53) | PTPRCSLC6A2SLC6A4SLC6A3MAPT | |
| SCHEMBL8765365 | 0.76 | KDM4E (0.45) | PTPRCMEN1KMT2ATSHRNPSR1 | |
| SCHEMBL28757186 | 0.75 | PTPRC (0.38) | PTPRCSLC6A2SLC6A4SLC6A3MAPT | |
| SCHEMBL8711975 | 0.74 | ALDH1A1 (0.32) | MEN1KMT2ATSHRNPSR1ALDH1A1 | |
| SCHEMBL29576400 | 0.74 | KDM4E (0.58) | PTPRCSLC6A2SLC6A4SLC6A3MAPT | |
| SCHEMBL68712 | 0.74 | KDM4E (0.58) | PTPRCSLC6A2SLC6A4SLC6A3MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250044689-A1 | MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-02-06 | — | — | US | disclosed |
| EP-4498160-A1 | MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-01-29 | — | — | EP | disclosed |
| CN-119371289-A | Monomer, polymer, chemically amplified negative resist composition, and resist pattern forming method | 信越化学工业株式会社 | 2025-01-28 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250044689-A1 | MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | PARG, PARN, PCNA | PTPRC 2382/4885SLC6A2 4478/4885SLC6A4 4140/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.