SCHEMBL5379907

SCHEMBL5379907

CC(=O)c1ccc2cccc3c2c1C=C3

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 6/20 0.42
▸ MEN1 O00255 5/20 0.42
▸ NPSR1 Q6W5P4 1/20 0.42
▸ ALDH1A1 P00352 6/20 0.37
▸ KDM4E B2RXH2 6/20 0.37
▸ HPGD P15428 5/20 0.37
▸ HSD17B10 Q99714 5/20 0.37
▸ CYP1A2 P05177 3/20 0.37
▸ GLA P06280 1/20 0.37
▸ POLB P06746 1/20 0.37
▸ CYP2D6 P10635 1/20 0.37
▸ TSHR P16473 3/20 0.36
▸ MAPT P10636 2/20 0.36
▸ GAA P10253 2/20 0.36
▸ RXFP1 Q9HBX9 1/20 0.36
▸ MAOB P27338 3/20 0.35
▸ MAOA P21397 1/20 0.34
▸ P2RX4 Q99571 1/20 0.34
▸ CYP1A1 P04798 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5371317 0.84 HSD17B10 (0.52) KMT2AMEN1ALDH1A1KDM4EHPGD
SCHEMBL31291020 0.82 PTPRC (0.47) KMT2AMEN1NPSR1ALDH1A1KDM4E
SCHEMBL15495742 0.82 PTPRC (0.47) KMT2AMEN1NPSR1ALDH1A1KDM4E
SCHEMBL8711975 0.81 ALDH1A1 (0.32) KMT2AMEN1NPSR1ALDH1A1KDM4E
SCHEMBL27901863 0.80 KMT2A (0.36) KMT2AMEN1ALDH1A1KDM4EHPGD
SCHEMBL15495689 0.76 ALDH1A1 (0.41) KMT2AMEN1ALDH1A1KDM4EHPGD
SCHEMBL9625084 0.75 HPGD (0.36) KMT2AMEN1ALDH1A1KDM4EHPGD
SCHEMBL5378153 0.73 ALDH1A1 (0.56) KMT2AMEN1NPSR1ALDH1A1KDM4E
SCHEMBL2516303 0.72 PPARG (0.41) KMT2AMEN1ALDH1A1KDM4EHPGD
SCHEMBL5033180 0.72 ALDH1A1 (0.47) KMT2AMEN1ALDH1A1KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070248911-A1 Pattern forming method and bilayer film IWASAWA HARUO 2007-10-25 — — US disclosed
US-7244549-B2 Pattern forming method and bilayer film JSR CORPORATION (JP) 2007-07-17 — — US disclosed
US-20030073040-A1 Pattern forming method and bilayer film JSR CORPORATION (JP) 2003-04-17 — — US disclosed
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