Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Pyridine SCHEMBL29217361 | 0.82 | TSHR (0.33) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL16448762 | 0.80 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL576102 | 0.79 | ALDH1A1 (0.33) | ALDH1A1L3MBTL1 | |
| SCHEMBL7599628 | 0.78 | ALDH1A1 (0.36) | ALDH1A1L3MBTL1TSHRTDP1 | |
| Propylene Glycol SCHEMBL575268 | 0.77 | TDP1 (0.42) | TDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL23152606 | 0.77 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL30400091 | 0.77 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL321209 | 0.77 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL16110994 | 0.76 | ALDH1A1 (0.35) | ALDH1A1L3MBTL1 | |
| SCHEMBL15203860 | 0.76 | ALDH1A1 (0.35) | ALDH1A1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119143638-A | Preparation method of 2-adamantanoic acid-trifluoropropane sulfonic acid-derived high-purity electronic grade photoinduced acid generator | 苏州威迈芯材半导体有限公司 | 2024-12-17 | — | — | CN | claimed |
| US-20240384065-A1 | SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND METHOD OF PRODUCING POLYSILOXANE | TORAY INDUSTRIES, INC. (JP) | 2024-11-21 | — | — | US | claimed |
| WO-2024185458-A1 | RESIN COMPOSITION, CURED FILM, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN OF CURED FILM, OPTICAL ELEMENT, AND METHOD FOR PRODUCING POLYSILOXANE | 東レ株式会社 | 2024-09-12 | — | — | WO | claimed |
| CN-117858927-A | Silicone resin composition for forming cured film, and method for producing polysiloxane | 东丽株式会社 | 2024-04-09 | — | — | CN | claimed |
| WO-2023048062-A1 | SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND METHOD FOR PRODUCING POLYSILOXANE | 東レ株式会社 | 2023-03-30 | — | — | WO | claimed |
| WO-2025022873-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND FINGERPRINT AUTHENTICATION DEVICE USING SAID CURED FILM | 東レ株式会社 | 2025-01-30 | — | — | WO | disclosed |
| US-20250020997-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| CN-119143638-A | Preparation method of 2-adamantanoic acid-trifluoropropane sulfonic acid-derived high-purity electronic grade photoinduced acid generator | 苏州威迈芯材半导体有限公司 | 2024-12-17 | — | — | CN | disclosed |
| CN-119143638-A | Preparation method of 2-adamantanoic acid-trifluoropropane sulfonic acid-derived high-purity electronic grade photoinduced acid generator | 苏州威迈芯材半导体有限公司 | 2024-12-17 | — | — | CN | disclosed |
| US-20240384065-A1 | SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND METHOD OF PRODUCING POLYSILOXANE | TORAY INDUSTRIES, INC. (JP) | 2024-11-21 | — | — | US | disclosed |
| WO-2024185458-A1 | RESIN COMPOSITION, CURED FILM, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN OF CURED FILM, OPTICAL ELEMENT, AND METHOD FOR PRODUCING POLYSILOXANE | 東レ株式会社 | 2024-09-12 | — | — | WO | disclosed |
| CN-117858927-A | Silicone resin composition for forming cured film, and method for producing polysiloxane | 东丽株式会社 | 2024-04-09 | — | — | CN | disclosed |
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2007-04-12 | — | — | US | disclosed |
| US-7101918-B2 | Hybrid type onium salt | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-05 | — | — | US | disclosed |
| EP-1690685-A2 | Planographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-16 | — | — | EP | disclosed |
| EP-1676835-A1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2005-10-20 | — | — | US | disclosed |
| US-20050020710-A1 | Hybrid onium salt | WAKO PURE CHEMICALS INDUSTRIES, LTD. (JP) | 2005-01-27 | — | — | US | disclosed |
| EP-1481973-A1 | HETEROCYCLE-BEARING ONIUM SALTS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-12-01 | — | — | EP | disclosed |
| EP-1443042-A1 | HYBRID ONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | ARSA, HAO2, HAO1 | ALDH1A1 139/4885L3MBTL1 3389/4885TSHR 1087/4885 |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | NOX4, CBR1, CBR3 | ALDH1A1 1190/4885L3MBTL1 4079/4885TSHR 1685/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.