SCHEMBL3132842

SCHEMBL3132842

C=Cc1ccc(OC(=O)c2ccc(C=C)cc2)cc1.C=Cc1ccc(OC)cc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 8/20 0.68
▸ KMT2A Q03164 6/20 0.68
▸ GFER P55789 1/20 0.68
▸ LMNA P02545 4/20 0.58
▸ CYP1A2 P05177 1/20 0.58
▸ CYP2C9 P11712 1/20 0.58
▸ CYP2C19 P33261 1/20 0.58
▸ SMN1; SMN2 Q16637 1/20 0.58
▸ PRSS1 P07477 1/20 0.55
▸ ACR P10323 1/20 0.55
▸ CA1 P00915 2/20 0.55
▸ CA2 P00918 2/20 0.55
▸ MEN1 O00255 1/20 0.54
▸ NPC1 O15118 1/20 0.51
▸ MAPK1 P28482 1/20 0.51
▸ F3 P13726 1/20 0.50
▸ KDM4E B2RXH2 3/20 0.49
▸ ALDH1A1 P00352 2/20 0.49
▸ GAA P10253 1/20 0.49
▸ CES2 O00748 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28924617 1.00 MAPT (0.68) MAPTKMT2AGFERLMNACYP1A2
SCHEMBL13607266 1.00 MAPT (0.68) MAPTKMT2AGFERLMNACYP1A2
SCHEMBL16812851 0.91 KMT2A (0.54) MAPTKMT2AGFERLMNACYP1A2
SCHEMBL103296 0.91 KMT2A (0.54) MAPTKMT2AGFERLMNACYP1A2
SCHEMBL12672144 0.88 KMT2A (0.54) MAPTKMT2AGFERLMNACYP1A2
SCHEMBL1088035 0.87 KMT2A (0.51) MAPTKMT2AGFERLMNASMN1; SMN2
SCHEMBL8016262 0.87 KMT2A (0.58) MAPTKMT2AGFERLMNACYP1A2
SCHEMBL13079826 0.87 KMT2A (0.58) MAPTKMT2AGFERLMNACYP1A2
SCHEMBL1088940 0.87 KMT2A (0.51) MAPTKMT2AGFERLMNASMN1; SMN2
SCHEMBL12931949 0.86 KMT2A (0.50) MAPTKMT2AGFERLMNACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2146246-B1 Negative resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-28 — — EP disclosed
EP-2146246-A1 Negative resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2010-01-20 — — EP disclosed
EP-1791025-A2 Negative resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2007-05-30 — — EP disclosed
US-20070111139-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-17 — — US disclosed
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