SCHEMBL31338693

SCHEMBL31338693

CS(=O)(=O)c1ccc2c(c1)sc1nc(-c3ccc(C(F)(F)F)cc3)cn12

nearest known ligand 0.47

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.47
MAPT P10636 4/20 0.47
TP53 P04637 3/20 0.47
PTGS2 P35354 2/20 0.47
TSHR P16473 1/20 0.47
RAB9A P51151 1/20 0.47
ATM Q13315 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
APP P05067 2/20 0.46
RXFP1 Q9HBX9 1/20 0.44
CA12 O43570 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
CA9 Q16790 1/20 0.43
F2RL3 Q96RI0 2/20 0.42
THRB P10828 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31338687 0.88 MAPT (0.53) LMNAMAPTTP53TSHRRAB9A
SCHEMBL24106018 0.85 CA12 (0.52) LMNAMAPTTP53PTGS2TSHR
SCHEMBL31236166 0.85 TP53 (0.63) LMNAMAPTTP53PTGS2TSHR
SCHEMBL24106081 0.85 TP53 (0.63) LMNAMAPTTP53PTGS2TSHR
SCHEMBL31338683 0.84 TP53 (0.47) LMNAMAPTTP53PTGS2TSHR
SCHEMBL31338707 0.83 TP53 (0.65) LMNAMAPTTP53TSHRRAB9A
SCHEMBL31338679 0.83 LMNA (0.53) LMNAMAPTTP53TSHRRAB9A
SCHEMBL31338669 0.82 CA12 (0.46) LMNAMAPTTP53PTGS2TSHR
SCHEMBL31338686 0.82 TP53 (0.51) LMNAMAPTTP53TSHRRAB9A
SCHEMBL31338708 0.81 MAPT (0.67) LMNAMAPTTP53TSHRRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4741401-A1 BENZOTHIAZOIMIDAZOLYL COMPOUND AND USE THEREOF ER Stress Research Institute, Inc. (JP) 2026-05-13 EP disclosed
WO-2025009553-A1 BENZOTHIAZOIMIDAZOLYL COMPOUND AND USE THEREOF 小胞体ストレス研究所株式会社 2025-01-09 WO disclosed