SCHEMBL3135196

SCHEMBL3135196

[Ba+2].[O-2].[O-2].[O-2].[O-2].[O-2].[Sr+2].[W+6]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ATP4AATP4B

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL865017 0.87
SCHEMBL3202966 0.87
SCHEMBL2899542 0.87
SCHEMBL6699419 0.75
SCHEMBL3148579 0.75
SCHEMBL5615326 0.75
SCHEMBL1981980 0.75
SCHEMBL58411 0.75
SCHEMBL6855995 0.75
SCHEMBL73924 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080207426-A1 Heat Insulating Composite and Methods of Manufacturing Thereof ADVANCED GLASS CERAMICS ESTABLISHMENT (LI) 2008-08-28 US claimed
WO-2008043373-A1 HEAT INSULATING COMPOSITE AND METHODS OF MANUFACTURING THEREOF ADVANCED GLASS CERAMICS ESTABLISHMENT (LI) 2008-04-17 WO claimed
EP-1890981-A1 HEAT INSULATING COMPOSITE AND METHODS OF MANUFACTURING THEREOF Advanced Glass Ceramics Establishment (LI) 2008-02-27 EP claimed
WO-2006128672-A1 HEAT INSULATING COMPOSITE AND METHODS OF MANUFACTURING THEREOF ADVANCED GLASS CERAMICS ESTABLISHMENT (LI) 2006-12-07 WO claimed
US-20040196620-A1 Dielectric laminate for a capacitor SHIPLEY COMPANY, L.L.C. 2004-10-07 US claimed
US-20020176989-A1 Dielectric laminate for a capacitor SHIPLEY COMPANY, L.L.C. 2002-11-28 US claimed
CN-120229763-A High-performance long-cycle high-nickel ternary positive electrode material and preparation method thereof 安徽得壹能源科技有限公司 2025-07-01 CN disclosed
US-8278243-B2 Laser imaging DATALASE LTD. (GB) 2012-10-02 US disclosed
US-20100075848-A1 Laser Imaging DATALASE LTD. (GB) 2010-03-25 US disclosed
US-20080207426-A1 Heat Insulating Composite and Methods of Manufacturing Thereof ADVANCED GLASS CERAMICS ESTABLISHMENT (LI) 2008-08-28 US disclosed
WO-2008043373-A1 HEAT INSULATING COMPOSITE AND METHODS OF MANUFACTURING THEREOF ADVANCED GLASS CERAMICS ESTABLISHMENT (LI) 2008-04-17 WO disclosed
EP-1890981-A1 HEAT INSULATING COMPOSITE AND METHODS OF MANUFACTURING THEREOF Advanced Glass Ceramics Establishment (LI) 2008-02-27 EP disclosed
WO-2006128672-A1 HEAT INSULATING COMPOSITE AND METHODS OF MANUFACTURING THEREOF ADVANCED GLASS CERAMICS ESTABLISHMENT (LI) 2006-12-07 WO disclosed
EP-1704057-A1 LASER IMAGING Sherwood Technology LTD. (GB) 2006-09-27 EP disclosed
WO-2005068207-A1 LASER IMAGING DATALASE LTD. (GB) 2005-07-28 WO disclosed
US-20040196620-A1 Dielectric laminate for a capacitor SHIPLEY COMPANY, L.L.C. 2004-10-07 US disclosed
US-20020176989-A1 Dielectric laminate for a capacitor SHIPLEY COMPANY, L.L.C. 2002-11-28 US disclosed
EP-1251530-A2 Dielectric laminate for a capacitor Shipley Company LLC (US) 2002-10-23 EP disclosed