⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13204013 | 0.84 | CYP2D6 (0.42) | — | |
| SCHEMBL10937705 | 0.81 | — | — | |
| SCHEMBL9768523 | 0.81 | LMNA (0.30) | — | |
| SCHEMBL1289366 | 0.80 | TSHR (0.34) | — | |
| SCHEMBL9615488 | 0.80 | — | — | |
| SCHEMBL6363375 | 0.79 | TSHR (0.33) | — | |
| SCHEMBL14190487 | 0.79 | — | — | |
| SCHEMBL5517773 | 0.75 | — | — | |
| SCHEMBL2800762 | 0.74 | MCL1 (0.38) | — | |
| Ethane SCHEMBL2815456 | 0.74 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 278 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190235376-A1 | THERMALLY-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND PREPARATION METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2019-08-01 | — | — | US | disclosed |
| EP-1637924-B1 | Image forming method using photothermographic material | FUJIFILM CORP (JP) | 2010-07-21 | — | — | EP | disclosed |
| US-20090291258-A1 | BASE TREATMENT METHOD OF A POLYESTER FILM AND POLYESTER FILM ARTICLE PRODUCED BY THEREOF | FUJIFILM CORPORATION (JP) | 2009-11-26 | — | — | US | disclosed |
| US-7608391-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2009-10-27 | — | — | US | disclosed |
| US-7497107-B2 | Gas sensing material and gas inspecting method | FUJI PHOTO FILM CO., LTD. (JP) | 2009-03-03 | — | — | US | disclosed |
| US-20090023103-A1 | SOLID DISPERSION, PROCESS OF PRODUCING SOLID DISPERSION, AND HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL | FUJIFILM CORPORATION (JP) | 2009-01-22 | — | — | US | disclosed |
| US-7465533-B2 | Photothermographic material and an image forming method | FUJIFILM CORPORPORATION (JP) | 2008-12-16 | — | — | US | disclosed |
| US-7462444-B2 | Image forming method for the photothermographic material | FUJIFILM CORPORATION (JP) | 2008-12-09 | — | — | US | disclosed |
| US-7455960-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2008-11-25 | — | — | US | disclosed |
| US-7448533-B2 | Medical image file management system and medical image film | FUJIFILM CORPORATION (JP) | 2008-11-11 | — | — | US | disclosed |
| EP-1308776-A2 | Photothermographic material and method of thermal development of the same | FUJI PHOTO FILM CO., LTD. (JP) | 2003-05-07 | — | — | EP | disclosed |
| EP-1283440-A1 | Photothermographic material | FUJI PHOTO FILM CO., LTD. (JP) | 2003-02-12 | — | — | EP | disclosed |
| EP-1276006-A1 | Image formation on heat-developable light-sensitive material and image forming apparatus | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-15 | — | — | EP | disclosed |
| EP-1276007-A1 | Heat-developable photosensitive material and image forming method | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-15 | — | — | EP | disclosed |
| US-20020197570-A1 | Thermally developable photosensitive material | FUJIFILM CORPORATION (JP) | 2002-12-26 | — | — | US | disclosed |
| US-20020102502-A1 | Thermal development photosensitive material | FUJIFILM CORPORATION (JP) | 2002-08-01 | — | — | US | disclosed |
| EP-1220026-A1 | Heat-developable image recording material | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-03 | — | — | EP | disclosed |
| US-6413705-B1 | UNDERCOAT LAYER COMPRISES A POLYESTER RESINS CONTAINING AT LEAST TWO KINDS OF WATER-SOLUBLE AND WATER DISPERSIBLE POLYESTER RESINS, EACH OF WHICH HAS DIFFERENT GLASS TRANSITION TEMPERATURE; ONE ISOPHTHALIC ACID WITH SULFONATE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-02 | — | — | US | disclosed |
| US-20020068245-A1 | Photothermographic material and heat development process | FUJIFILM CORPORATION (JP) | 2002-06-06 | — | — | US | disclosed |
| US-20020048732-A1 | Photothermographic material and method for forming images | FUJIFILM CORPORATION (JP) | 2002-04-25 | — | — | US | disclosed |