⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3144412 | 0.75 | — | — | |
| SCHEMBL8007121 | 0.75 | TSHR (0.39) | — | |
| SCHEMBL3844079 | 0.75 | TSHR (0.30) | — | |
| SCHEMBL28550206 | 0.71 | ALDH1A1 (0.33) | — | |
| SCHEMBL5010901 | 0.67 | MTNR1A (0.32) | — | |
| SCHEMBL3907662 | 0.65 | ALDH1A1 (0.32) | — | |
| SCHEMBL5830226 | 0.64 | ALDH1A1 (0.43) | — | |
| SCHEMBL108347 | 0.62 | TSHR (0.56) | — | |
| SCHEMBL13204013 | 0.62 | CYP2D6 (0.42) | — | |
| SCHEMBL18559656 | 0.62 | TSHR (0.45) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7157218-B2 | Suppressed fogging and printout and is excellent in storage stability of an image against stain | FUJIFILM CORPORATION (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7112402-B2 | Photothermographic material | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-26 | — | — | US | disclosed |
| US-7083908-B2 | Photothermographic material | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-01 | — | — | US | disclosed |
| US-6924089-B2 | Heat-developable photosensitive material and image forming method | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-02 | — | — | US | disclosed |
| US-20050147931-A1 | Process for manufacturing a photothermographic material | FUJI PHOTO FILM CO., LTD. | 2005-07-07 | — | — | US | disclosed |
| US-6844129-B2 | Heat-developable photosensitive material, and method of producing the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-01-18 | — | — | US | disclosed |
| US-6821721-B2 | LOW CHANGES IN PHOTOGRAPHIC PERFORMANCE OF A PHOTOTHERMOGRAPHIC MATERIAL IN THE STORAGE STATE | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-23 | — | — | US | disclosed |
| US-20040185389-A1 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2004-09-23 | — | — | US | disclosed |
| US-20040161714-A1 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2004-08-19 | — | — | US | disclosed |
| US-20040115573-A1 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2004-06-17 | — | — | US | disclosed |
| US-20030235794-A1 | Photothermographic material | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-25 | — | — | US | disclosed |
| US-20030235791-A1 | Heat-developable photosensitive material and image forming method | FUJI PHOTO FILM CO., LTD. | 2003-12-25 | — | — | US | disclosed |
| US-20030224307-A1 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2003-12-04 | — | — | US | disclosed |
| US-20030203330-A1 | Photothermographic material | FUJI PHOTO FILM CO., LTD. | 2003-10-30 | — | — | US | disclosed |
| US-20030124472-A1 | Heat-developable photosensitive material and method of porducing the same | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-03 | — | — | US | disclosed |
| US-20030099898-A1 | Heat-developable photosensitive material, and method of producing the same | FUJIFILM CORPORATION (JP) | 2003-05-29 | — | — | US | disclosed |