Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.40 |
| ▸ | PKM | P14618 | 3/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 6/20 | 0.35 |
| ▸ | CA2 | P00918 | 6/20 | 0.35 |
| ▸ | GAA | P10253 | 3/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | MMP1 | P03956 | 2/20 | 0.34 |
| ▸ | MMP2 | P08253 | 2/20 | 0.34 |
| ▸ | MMP9 | P14780 | 2/20 | 0.34 |
| ▸ | MMP8 | P22894 | 2/20 | 0.34 |
| ▸ | MMP13 | P45452 | 2/20 | 0.34 |
| ▸ | HTT | P42858 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | PKLR | P30613 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL454990 | 0.99 | HSD11B1 (0.40) | HSD11B1PKMKCNH2CA1CA2 | |
| SCHEMBL2898530 | 0.95 | ACHE (0.39) | HSD11B1PKMGAAKMT2ALMNA | |
| SCHEMBL1088919 | 0.95 | GAA (0.37) | HSD11B1PKMKCNH2CA1CA2 | |
| SCHEMBL3132260 | 0.95 | GAA (0.37) | HSD11B1PKMKCNH2CA1CA2 | |
| SCHEMBL3132695 | 0.95 | GAA (0.37) | HSD11B1PKMKCNH2CA1CA2 | |
| SCHEMBL3144464 | 0.95 | GAA (0.37) | HSD11B1PKMKCNH2CA1CA2 | |
| SCHEMBL3126974 | 0.93 | GAA (0.38) | HSD11B1PKMKCNH2GAAKMT2A | |
| SCHEMBL2903842 | 0.93 | ACHE (0.40) | HSD11B1PKMKMT2ALMNAMAPT | |
| SCHEMBL270992 | 0.93 | GAA (0.38) | HSD11B1PKMKCNH2GAAKMT2A | |
| SCHEMBL5856487 | 0.90 | HSD11B1 (0.39) | HSD11B1PKMKCNH2CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9023584-B2 | Radiation-sensitive composition, and compound | JSR CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20130280658-A1 | RADIATION-SENSITIVE COMPOSITION, AND COMPOUND | JSR CORPORATION (JP) | 2013-10-24 | — | — | US | disclosed |
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| US-8389202-B2 | Polymer, radiation-sensitive composition, monomer, and method of producing compound | JSR CORPORATION (JP) | 2013-03-05 | — | — | US | disclosed |
| US-8377627-B2 | Compound and radiation-sensitive composition | JSR CORPORATION (JP) | 2013-02-19 | — | — | US | disclosed |
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | JSR CORPORATION (JP) | 2012-07-12 | — | — | US | disclosed |
| US-20120164582-A1 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |
| US-8173351-B2 | Compound and radiation-sensitive composition | JSR CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| EP-1950610-B1 | IMMERSION LITHOGRAPHIC COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-20020081523-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL CO., LTD. | 2002-06-27 | — | — | US | disclosed |
| US-6406830-B2 | BIS(SULFONIUM METHYL)KETONE BISPERFLUOROALKANESULFONATE ACID GENERATOR WITH TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALTS, AND A RESIN HAVING A UNIT UNSTABLE TO AN ACID, SUCH AS 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE; RESOLUTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-06-18 | — | — | US | disclosed |
| US-6383713-B1 | ADAMANTYL ACRYLATE POLYMERS AND ACID GENERATORS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-07 | — | — | US | disclosed |
| US-6348297-B1 | COMPOSITION COMPRISING ACID GENERATOR COMPRISING ALIPHATIC SULFONIUM SALT, TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALT,RESIN HAVING ACID-LABILE GROUP WHICH IS INSOLUBLE IN ALKALI BUT BECOMES SOLUBLE BY ACTION OF ACID | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-19 | — | — | US | disclosed |
| US-20020015913-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-07 | — | — | US | disclosed |
| US-20020006582-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | disclosed |
| EP-1167349-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-02 | — | — | EP | disclosed |
| EP-1154321-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-14 | — | — | EP | disclosed |
| EP-1041442-A1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-10-04 | — | — | EP | disclosed |
| EP-1020767-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-07-19 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | RAD51, PYM1, MRE11 | HSD11B1 1551/4885PKM 1043/4885KCNH2 2615/4885 |
| US-20120164582-A1 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND | RAD51, RER1, ATP6AP1 | HSD11B1 2856/4885PKM 1371/4885KCNH2 641/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.