Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.41 |
| ▸ | ESRRG | P62508 | 1/20 | 0.40 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | ESR1 | P03372 | 1/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | MAOA | P21397 | 1/20 | 0.35 |
| ▸ | MASP2 | O00187 | 1/20 | 0.34 |
| ▸ | PLAU | P00749 | 1/20 | 0.34 |
| ▸ | THPO | P40225 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23792833 | 0.84 | CYP19A1 (0.39) | EPHX2ESRRGCYP19A1ESR1ESR2 | |
| SCHEMBL3419256 | 0.82 | SHBG (0.53) | MAPTESRRGALDH1A1HPGDMAPK1 | |
| SCHEMBL1408639 | 0.82 | NPC1 (0.46) | NPC1MAPTRAB9AALDH1A1HPGD | |
| SCHEMBL27955984 | 0.81 | HDAC3 (0.42) | EPHX2ESR1ESR2 | |
| SCHEMBL1408654 | 0.81 | CYP2C9 (0.41) | NPC1RAB9AALDH1A1HPGDLMNA | |
| SCHEMBL6935320 | 0.81 | MAOA (0.41) | RAB9AESR1ESR2LMNAMAOA | |
| SCHEMBL20975679 | 0.78 | CYP19A1 (0.43) | NPC1MAPTRAB9AEPHX2ESRRG | |
| SCHEMBL10597720 | 0.77 | HDAC1 (0.34) | NPC1MAPTRAB9AEPHX2ALDH1A1 | |
| SCHEMBL9360407 | 0.76 | NPC1 (0.48) | NPC1MAPTRAB9AALDH1A1HPGD | |
| SCHEMBL14921 | 0.76 | TAAR1 (0.48) | ALDH1A1MAPK1ESR1ESR2CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114008525-B | Method for producing purified resist composition, method for forming resist pattern, and purified resist composition | 东京应化工业株式会社 | 2025-05-23 | — | — | CN | disclosed |
| US-20250153114-A1 | POLYIMIDE-CONTAINING FILTRATION MEMBRANE, FILTERS, AND METHODS | ENTEGRIS, INC. | 2025-05-15 | — | — | US | disclosed |
| US-20250110406-A1 | METHOD OF PRODUCING RESIST COMPOSITION PURIFIED PRODUCT, RESIST PATTERN FORMING METHOD, AND RESIST COMPOSITION PURIFIED PRODUCT | TOKYO OHKA KOGYO CO LTD (JP) | 2025-04-03 | — | — | US | disclosed |
| WO-2025053071-A1 | POROUS FILM AND METHOD FOR PRODUCING POROUS FILM | 東京応化工業株式会社 | 2025-03-13 | — | — | WO | disclosed |
| CN-119552505-A | Composition for producing porous film, method for producing porous film, and porous film | 东京应化工业株式会社 | 2025-03-04 | — | — | CN | disclosed |
| CN-119503513-A | Winding device, film winding method, and method for producing porous imide resin film | 东京应化工业株式会社 | 2025-02-25 | — | — | CN | disclosed |
| CN-119503516-A | Slitting machine and system for manufacturing porous imide resin film | 东京应化工业株式会社 | 2025-02-25 | — | — | CN | disclosed |
| US-20250050269-A1 | GAS SEPARATION MEMBRANE, GAS SEPARATION MEMBRANE MODULE, AND GAS PERMEABLE APPARATUS | HITACHI GE VERNOVA NUCLEAR ENERGY, LTD. (JP) | 2025-02-13 | — | — | US | disclosed |
| CN-107249720-B | Method for purifying liquid, method for producing chemical liquid or cleaning liquid, filter medium, and filter device | 东京应化工业株式会社 | 2025-01-10 | — | — | CN | disclosed |
| US-12186715-B2 | Production method for resist composition purified product, resist pattern forming method, and resist composition purified product | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-01-07 | — | — | US | disclosed |
| US-20080081294-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF CURED RELIEF PATTERN USING THE SAME AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| EP-1906246-A2 | Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device | FUJIFILM Corporation (JP) | 2008-04-02 | — | — | EP | disclosed |
| US-5756254-A | CONTAINING PHOTOSENSITIVE ACID GENERATOR | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-05-26 | — | — | US | disclosed |
| US-5753407-A | Polyamic acid composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-05-19 | — | — | US | disclosed |
| US-5585217-A | Polyamic acid composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-12-17 | — | — | US | disclosed |
| US-5518864-A | PHOTOSENSITIVE, QUINONE DIAZIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-05-21 | — | — | US | disclosed |
| EP-0431971-B1 | Photosensitive composition and resin-encapsulated semiconductor device | TOSHIBA KK (JP) | 1995-07-19 | — | — | EP | disclosed |
| US-5340684-A | Polyimidesiloxane copolymers | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-08-23 | — | — | US | disclosed |
| EP-0431971-A2 | Photosensitive composition and resin-encapsulated semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 1991-06-12 | — | — | EP | disclosed |
| US-4323662-A | Thermosetting resin compositions comprising bismaleimides and alkenylaniline derivatives | MITSUI TOATSU CHEMICALS, INC. (JP) | 1982-04-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12186715-B2 | Production method for resist composition purified product, resist pattern forming method, and resist composition purified product | PUF60, RIOK2, SLC11A2 | NPC1 3418/4885MAPT 2939/4885RAB9A 1882/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.