Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NCOA1 | Q15788 | 1/20 | 0.55 |
| ▸ | NCOA3 | Q9Y6Q9 | 1/20 | 0.55 |
| ▸ | MAOA | P21397 | 2/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 4/20 | 0.45 |
| ▸ | MEN1 | O00255 | 3/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.45 |
| ▸ | GAA | P10253 | 2/20 | 0.45 |
| ▸ | MITF | O75030 | 1/20 | 0.45 |
| ▸ | GFER | P55789 | 1/20 | 0.45 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.45 |
| ▸ | NOD2 | Q9HC29 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.44 |
| ▸ | APAF1 | O14727 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7876076 | 0.89 | NCOA1 (0.53) | NCOA1NCOA3MAOAALDH1A1TDP1 | |
| SCHEMBL7225717 | 0.88 | NCOA1 (0.55) | NCOA1NCOA3MAOAALDH1A1TDP1 | |
| SCHEMBL11019469 | 0.85 | MAOA (0.52) | NCOA1NCOA3MAOAALDH1A1TDP1 | |
| SCHEMBL11239908 | 0.85 | NCOA1 (0.51) | NCOA1NCOA3MAOAALDH1A1TDP1 | |
| SCHEMBL28007611 | 0.85 | NCOA1 (0.51) | NCOA1NCOA3MAOAALDH1A1TDP1 | |
| SCHEMBL795222 | 0.83 | TSHR (0.50) | ALDH1A1TSHRKMT2AGAAMAPK1 | |
| SCHEMBL459355 | 0.83 | MAOA (0.68) | NCOA1NCOA3MAOAALDH1A1TDP1 | |
| SCHEMBL29476109 | 0.83 | MAOA (0.68) | NCOA1NCOA3MAOAALDH1A1TDP1 | |
| SCHEMBL1270920 | 0.83 | MAOA (0.68) | NCOA1NCOA3MAOAALDH1A1TDP1 | |
| SCHEMBL6290292 | 0.81 | MAOA (0.65) | NCOA1NCOA3MAOAALDH1A1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240329525-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-10-03 | — | — | US | disclosed |
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | disclosed |
| CN-112512792-B | Laminate and method for producing laminate | 东洋纺株式会社 | 2023-02-17 | — | — | CN | disclosed |
| CN-115185157-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-114846082-A | Resin composition and film | 株式会社钟化 | 2022-08-02 | — | — | CN | disclosed |
| CN-114423612-A | Laminate manufacturing device and laminate manufacturing method | 东洋纺株式会社 | 2022-04-29 | — | — | CN | disclosed |
| CN-110225820-B | Method for manufacturing polymer film laminated substrate and flexible electronic device | 东洋纺株式会社 | 2022-01-28 | — | — | CN | disclosed |
| CN-113820920-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-12-21 | — | — | CN | disclosed |
| CN-113574118-A | Liquid composition, powder, and method for producing powder | ＡＧＣ株式会社 | 2021-10-29 | — | — | CN | disclosed |
| EP-0758665-A1 | Polyimides and optical parts obtained by using the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1997-02-19 | — | — | EP | disclosed |
| US-5518864-A | PHOTOSENSITIVE, QUINONE DIAZIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-05-21 | — | — | US | disclosed |
| US-5348835-A | Without photoresist | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-09-20 | — | — | US | disclosed |
| EP-0304136-B1 | Novel photosensitive composition | ASAHI CHEMICAL IND (JP) | 1994-06-29 | — | — | EP | disclosed |
| EP-0478321-A1 | Photosenstive resin composition for forming polyimide film pattern and method of forming polyimide film pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 1992-04-01 | — | — | EP | disclosed |
| US-5019482-A | Polymer/oxime ester/coumarin compound photosensitive composition | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1991-05-28 | — | — | US | disclosed |
| EP-0263212-B1 | METHOD FOR REMOVING WATER VAPOR FROM WATER VAPOR-CONTAINING GAS | UBE INDUSTRIES, LTD. (JP) | 1990-12-27 | — | — | EP | disclosed |
| EP-0304136-A2 | Novel photosensitive composition | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1989-02-22 | — | — | EP | disclosed |
| EP-0263212-A1 | Method for removing water vapor from water vapor-containing gas | UBE INDUSTRIES, LTD. (JP) | 1988-04-13 | — | — | EP | disclosed |
| US-4718921-A | Method for removing water vapor from water vapor-containing gas | UBE INDUSTRIES, LTD. (JP) | 1988-01-12 | — | — | US | disclosed |