SCHEMBL3145740

SCHEMBL3145740

NC(=O)c1c(F)c(F)c(N)c(F)c1F

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.35
CES2 O00748 1/20 0.32
CES1 P23141 1/20 0.32
KCNN4 O15554 1/20 0.30
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8895324 0.90 POLB (0.32) POLBCES2CES1
SCHEMBL811680 0.88 POLB (0.41) POLBCES2CES1HTT
SCHEMBL6124196 0.86 CES2 (0.36) POLBCES2CES1HTT
SCHEMBL28298959 0.85 POLB (0.39) POLBCES2CES1HTT
SCHEMBL161645 0.85 CES2 (0.42) POLBCES2CES1HTT
SCHEMBL1703382 0.82 CES2 (0.40) POLBCES2CES1HTT
SCHEMBL12544632 0.82 CES2 (0.40) POLBCES2CES1HTT
Bromide SCHEMBL29086958 0.82 CES2 (0.40) POLBCES2CES1HTT
SCHEMBL7869943 0.80 CES2 (0.33) CES2CES1HTT
SCHEMBL9147301 0.79 CES2 (0.42) POLBCES2CES1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11894429-B2 Amorphous metal oxide semiconductor layer and semiconductor device NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2024-02-06 US claimed
US-20220328635-A1 AMORPHOUS METAL OXIDE SEMICONDUCTOR LAYER AND SEMICONDUCTOR DEVICE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2022-10-13 US claimed
US-10756190-B2 Precursor composition for forming amorphous metal oxide semiconductor layer, amorphous metal oxide semiconductor layer, method for producing same, and semiconductor device NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-08-25 US claimed
CN-103026474-B Precursor composition for forming amorphous metal oxide semiconductor layer, method for producing same, and semiconductor device 日产化学工业株式会社 2016-08-24 CN claimed
US-5354495-A Homo- or copolymerizable through ethylenic unsaturation NIPPON PAINT CO., LTD. (JP) 1994-10-11 US claimed
EP-0177122-B1 ACRYLAMIDE DERIVATIVES Nippon Paint Co., Ltd. (JP) 1992-04-01 EP claimed
US-4935413-A ELASTICITY, ADHESION AND DISPERSIBILITY NIPPON PAINT CO., LTD. (JP) 1990-06-19 US claimed
US-11894429-B2 Amorphous metal oxide semiconductor layer and semiconductor device NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2024-02-06 US disclosed
US-20230146966-A1 ELECTROLUMINESCENCE ELEMENT AND METHOD OF MANUFACTURING ELECTROLUMINESCENCE ELEMENT MIKUNI ELECTRON CORPORATION (JP) 2023-05-11 US disclosed
EP-4170722-A1 REVERSED-STRUCTURE ELECTROLUMINESCENCE ELEMENT HAVING COATED INORGANIC TRANSPARENT OXIDE SEMICONDUCTOR ELECTRON TRANSPORT LAYER Mikuni Electron Corporation (JP) 2023-04-26 EP disclosed
US-20220328635-A1 AMORPHOUS METAL OXIDE SEMICONDUCTOR LAYER AND SEMICONDUCTOR DEVICE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2022-10-13 US disclosed
WO-2021261493-A1 REVERSED-STRUCTURE ELECTROLUMINESCENCE ELEMENT HAVING COATED INORGANIC TRANSPARENT OXIDE SEMICONDUCTOR ELECTRON TRANSPORT LAYER 三国電子有限会社 2021-12-30 WO disclosed
US-20200350413-A1 AMORPHOUS METAL OXIDE SEMICONDUCTOR LAYER AND SEMICONDUCTOR DEVICE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-11-05 US disclosed
WO-1997027331-A2 METHODS AND COMPOSITIONS FOR DETERMINING THE SEQUENCE OF NUCLEIC ACID MOLECULES RAPIGENE, INC. (US) 1997-07-31 WO disclosed
EP-0630921-A2 Functional polymers and their production NIPPON PAINT CO., LTD. (JP) 1994-12-28 EP disclosed
US-5354495-A Homo- or copolymerizable through ethylenic unsaturation NIPPON PAINT CO., LTD. (JP) 1994-10-11 US disclosed
EP-0177122-B1 ACRYLAMIDE DERIVATIVES Nippon Paint Co., Ltd. (JP) 1992-04-01 EP disclosed
US-4935413-A ELASTICITY, ADHESION AND DISPERSIBILITY NIPPON PAINT CO., LTD. (JP) 1990-06-19 US disclosed
EP-0207621-A2 Functional polymers and their production Nippon Paint Co., Ltd. (JP) 1987-01-07 EP disclosed
EP-0177122-A2 Acrylamide derivatives Nippon Paint Co., Ltd. (JP) 1986-04-09 EP disclosed