Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | S100A4 | P26447 | 5/20 | 0.42 |
| ▸ | MEN1 | O00255 | 4/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.35 |
| ▸ | CDC25B | P30305 | 2/20 | 0.35 |
| ▸ | IDO1 | P14902 | 1/20 | 0.35 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.35 |
| ▸ | DNMT3L | Q9UJW3 | 1/20 | 0.35 |
| ▸ | DNMT3A | Q9Y6K1 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 3/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.34 |
| ▸ | POLB | P06746 | 2/20 | 0.34 |
| ▸ | THRB | P10828 | 2/20 | 0.34 |
| ▸ | RAB9A | P51151 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | APAF1 | O14727 | 2/20 | 0.34 |
| ▸ | TDP2 | O95551 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | CES2 | O00748 | 1/20 | 0.34 |
| ▸ | TERT | O14746 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30048825 | 1.00 | S100A4 (0.42) | S100A4MEN1KMT2ACDC25BIDO1 | |
| SCHEMBL5375910 | 0.87 | MEN1 (0.35) | S100A4MEN1KMT2ACDC25BIDO1 | |
| SCHEMBL6848561 | 0.85 | S100A4 (0.39) | S100A4MEN1KMT2ACDC25BIDO1 | |
| SCHEMBL1412039 | 0.83 | S100A4 (0.38) | S100A4MEN1KMT2ACDC25BIDO1 | |
| SCHEMBL1412040 | 0.83 | S100A4 (0.38) | S100A4MEN1KMT2ACDC25BIDO1 | |
| SCHEMBL31493507 | 0.82 | S100A4 (0.37) | S100A4MEN1KMT2ACDC25BIDO1 | |
| SCHEMBL5246311 | 0.82 | S100A4 (0.37) | S100A4MEN1KMT2ACDC25BIDO1 | |
| SCHEMBL5246302 | 0.82 | S100A4 (0.37) | S100A4MEN1KMT2ACDC25BIDO1 | |
| Hydrochloric Acid SCHEMBL5467571 | 0.82 | S100A4 (0.37) | S100A4MEN1KMT2ACDC25BIDO1 | |
| SCHEMBL7597246 | 0.77 | S100A4 (0.47) | S100A4MEN1KMT2ACDC25BIDO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 149 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119899209-A | Silicon-containing photoacid generator and preparation method thereof, thick film photoresist, photoresist layer and preparation method thereof | 阜阳欣奕华新材料科技股份有限公司 | 2025-04-29 | — | — | CN | claimed |
| CN-119751320-A | Diazonaphthoquinone type photosensitive compound and application thereof in photoresist preparation | 湖北三峡实验室 | 2025-04-04 | — | — | CN | claimed |
| CN-119591780-A | Photoresist additive and photoresist composition | 合肥鼎材科技有限公司 | 2025-03-11 | — | — | CN | claimed |
| CN-119528709-A | Polycarbonyl enol compound, preparation method thereof and application thereof in photoinitiator synthesis | 湖北三峡实验室 | 2025-02-28 | — | — | CN | claimed |
| CN-119511634-A | Photoresist composition modification method | 湖北三峡实验室 | 2025-02-25 | — | — | CN | claimed |
| CN-119493336-A | G/I line photoresist | 湖北三峡实验室 | 2025-02-21 | — | — | CN | claimed |
| CN-118732397-A | Positive photoresist composition and method for producing resist pattern | 常州强力先端电子材料有限公司 | 2024-10-01 | — | — | CN | claimed |
| CN-117720440-A | Process synthesis method of diazonaphthoquinone sulfonyl chloride compound | 湖北兴福电子材料股份有限公司 | 2024-03-19 | — | — | CN | claimed |
| CN-117285710-A | Self-photosensitive polybenzoxazole precursor resin and preparation method thereof | 江苏艾森半导体材料股份有限公司 | 2023-12-26 | — | — | CN | claimed |
| CN-111176073-B | Thick film photoresist composition containing high heat resistance carboxyl phenolic resin | 苏州瑞红电子化学品有限公司 | 2023-11-07 | — | — | CN | claimed |
| EP-1053508-B1 | A PROCESS FOR MAKING A PHOTOACTIVE COMPOUND AND PHOTORESIST THEREFROM | CLARIANT FINANCE BVI LTD (VG) | 2002-08-28 | — | — | EP | claimed |
| WO-2002031011-A2 | FRACTIONATION OF RESINS USING A STATIC MIXER AND A LIQUID-LIQUID CENTRIFUGE | CLARIANT INTERNATIONAL LTD (CH) | 2002-04-18 | — | — | WO | claimed |
| EP-1053508-A1 | A PROCESS FOR MAKING A PHOTOACTIVE COMPOUND AND PHOTORESIST THEREFROM | Clariant International Ltd. (CH) | 2000-11-22 | — | — | EP | claimed |
| US-5936071-A | Process for making a photoactive compound and photoresist therefrom | CLARIANT FINANCE (BVI) LIMITED (VG) | 1999-08-10 | — | — | US | claimed |
| WO-1999039245-A1 | A PROCESS FOR MAKING A PHOTOACTIVE COMPOUND AND PHOTORESIST THEREFROM | CLARIANT INTERNATIONAL LTD. (CH) | 1999-08-05 | — | — | WO | claimed |
| EP-0614120-B1 | A source of photochemically generated acid for microelectronic photoresists | MORTON INT INC (US) | 1997-04-16 | — | — | EP | claimed |
| EP-0488686-B1 | A process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORP (US) | 1995-09-27 | — | — | EP | claimed |
| EP-0614120-A1 | A source of photochemically generated acid for microelectronic photoresists | MORTON INTERNATIONAL, INC. (US) | 1994-09-07 | — | — | EP | claimed |
| US-5308744-A | Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives | MORTON INTERNATIONAL, INC. (US) | 1994-05-03 | — | — | US | claimed |
| US-5141838-A | Lithography printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1992-08-25 | — | — | US | claimed |