Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | S100A4 | P26447 | 3/20 | 0.39 |
| ▸ | MEN1 | O00255 | 4/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.37 |
| ▸ | CDC25B | P30305 | 3/20 | 0.37 |
| ▸ | APAF1 | O14727 | 2/20 | 0.36 |
| ▸ | TDP2 | O95551 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 4/20 | 0.35 |
| ▸ | POLB | P06746 | 3/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.35 |
| ▸ | LMNA | P02545 | 3/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.35 |
| ▸ | RAB9A | P51151 | 3/20 | 0.35 |
| ▸ | THRB | P10828 | 2/20 | 0.35 |
| ▸ | BLM | P54132 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | TERT | O14746 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | PLIN1 | O60240 | 1/20 | 0.35 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30048825 | 0.85 | S100A4 (0.42) | S100A4MEN1KMT2ACDC25BAPAF1 | |
| SCHEMBL1412039 | 0.85 | S100A4 (0.38) | S100A4MEN1KMT2ACDC25BAPAF1 | |
| SCHEMBL3147191 | 0.85 | S100A4 (0.42) | S100A4MEN1KMT2ACDC25BAPAF1 | |
| SCHEMBL1412040 | 0.85 | S100A4 (0.38) | S100A4MEN1KMT2ACDC25BAPAF1 | |
| SCHEMBL5246302 | 0.83 | S100A4 (0.37) | S100A4MEN1KMT2ACDC25BAPAF1 | |
| SCHEMBL5246311 | 0.83 | S100A4 (0.37) | S100A4MEN1KMT2ACDC25BAPAF1 | |
| SCHEMBL31493507 | 0.83 | S100A4 (0.37) | S100A4MEN1KMT2ACDC25BAPAF1 | |
| Hydrochloric Acid SCHEMBL5467571 | 0.83 | S100A4 (0.37) | S100A4MEN1KMT2ACDC25BAPAF1 | |
| Phenol SCHEMBL3136009 | 0.79 | MEN1 (0.38) | S100A4MEN1KMT2AAPAF1TDP2 | |
| Phenol SCHEMBL28963693 | 0.79 | MEN1 (0.38) | S100A4MEN1KMT2AAPAF1TDP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0184553-B1 | MODIFIED PHENOLIC RESINS AND THEIR FABRICATION | CIBA-GEIGY AG (CH) | 1991-07-31 | — | — | EP | claimed |
| EP-0220544-A2 | Non-precipitating photoresist composition | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1987-05-06 | — | — | EP | claimed |
| US-6767983-B1 | SILICONE RESINS HAVING SPECIFIED TRIORGANOSILYL GROUP LINKED TO ALL OR PART OF ENDS OF BACKBONE CHAIN OF POLYSILSESQUIOXANES; PHOTORESISTS | NIPPON STEEL CHEMICAL CO., LTD. (JP) | 2004-07-27 | — | — | US | disclosed |
| EP-0568476-B1 | Silicon-containing positive resist and method of using the same in thin film packaging technology | IBM (US) | 1995-10-11 | — | — | EP | disclosed |
| US-5422223-A | Polysilsesquioxanes having diazonaphthoquinone sulfonyloxy group modifiers; barrier films for lithographic process | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1995-06-06 | — | — | US | disclosed |
| US-5422223-A | Polysilsesquioxanes having diazonaphthoquinone sulfonyloxy group modifiers; barrier films for lithographic process | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1995-06-06 | — | — | US | disclosed |
| US-5399462-A | Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1995-03-21 | — | — | US | disclosed |
| EP-0599762-A1 | Method of forming sub-half micron patterns with optical lithography using bilayer resist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-06-01 | — | — | EP | disclosed |
| EP-0568476-A2 | Silicon-containing positive resist and method of using the same in thin film packaging technology | International Business Machines Corporation (US) | 1993-11-03 | — | — | EP | disclosed |
| EP-0220544-A3 | NON-PRECIPITATING PHOTORESIST COMPOSITION | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1987-08-26 | — | — | EP | disclosed |
| US-4684597-A | Non-precipitating quinone diazide polymer containing photoresist composition with o-quinone diazide trisester as dissolution inhibitor | EASTMAN KODAK COMPANY (US) | 1987-08-04 | — | — | US | disclosed |
| US-4684597-A | Non-precipitating quinone diazide polymer containing photoresist composition with o-quinone diazide trisester as dissolution inhibitor | EASTMAN KODAK COMPANY (US) | 1987-08-04 | — | — | US | disclosed |
| EP-0220544-A2 | Non-precipitating photoresist composition | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1987-05-06 | — | — | EP | disclosed |
| EP-0220544-A2 | Non-precipitating photoresist composition | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1987-05-06 | — | — | EP | disclosed |