SCHEMBL5375910

SCHEMBL5375910

[N-]=[N+]=C1c2ccccc2C(=O)C(=O)C1S(=O)(=O)Cl

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.35
KMT2A Q03164 4/20 0.35
CDC25B P30305 2/20 0.35
DNMT1 P26358 2/20 0.35
IDO1 P14902 1/20 0.35
DNMT3L Q9UJW3 1/20 0.35
DNMT3A Q9Y6K1 1/20 0.35
S100A4 P26447 4/20 0.34
APAF1 O14727 2/20 0.34
TDP2 O95551 2/20 0.34
POLB P06746 2/20 0.34
THRB P10828 2/20 0.34
KDM4E B2RXH2 1/20 0.34
CES2 O00748 1/20 0.34
TERT O14746 1/20 0.34
NPC1 O15118 1/20 0.34
PLIN1 O60240 1/20 0.34
S1PR4 O95977 1/20 0.34
LMNA P02545 1/20 0.34
PLA2G1B P04054 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3147191 0.87 S100A4 (0.42) MEN1KMT2ACDC25BDNMT1IDO1
SCHEMBL30048825 0.87 S100A4 (0.42) MEN1KMT2ACDC25BDNMT1IDO1
SCHEMBL3792513 0.83 MEN1 (0.35) MEN1KMT2ACDC25BDNMT1IDO1
SCHEMBL6848561 0.71 S100A4 (0.39) MEN1KMT2ACDC25BDNMT1IDO1
SCHEMBL7597246 0.70 S100A4 (0.47) MEN1KMT2ACDC25BDNMT1IDO1
SCHEMBL1412039 0.70 S100A4 (0.38) MEN1KMT2ACDC25BDNMT1IDO1
SCHEMBL1412040 0.70 S100A4 (0.38) MEN1KMT2ACDC25BDNMT1IDO1
SCHEMBL15485698 0.69 MAOA (0.41) MEN1KMT2AS100A4APAF1TDP2
SCHEMBL5246302 0.69 S100A4 (0.37) MEN1KMT2ACDC25BDNMT1IDO1
Hydrochloric Acid SCHEMBL5467571 0.69 S100A4 (0.37) MEN1KMT2ACDC25BDNMT1IDO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7198878-B2 Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance THE DOW CHEMICAL COMPANY (US) 2007-04-03 US disclosed
US-7019093-B2 Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance DOW GLOBAL TECHNOLOGIES INC. (US) 2006-03-28 US disclosed
US-20050228147-A1 Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance DOW GLOBAL TECHNOLOGIES INC. 2005-10-13 US disclosed
WO-2004038505-A1 AQUEOUS DEVELOPABLE, PHOTOSENSITIVE BENZOCYCLOBUTENE-BASED OLIGOMERS AND POLYMERS WITH HIGH MOISTURE RESISTANCE DOW GLOBAL TECHNOLOGIES INC. (US) 2004-05-06 WO disclosed
US-20040076911-A1 Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance DOW GLOBAL TECHNOLOGIES LLC 2004-04-22 US disclosed