SCHEMBL31474474

SCHEMBL31474474

CCC(C)(C)C=Cc1ccc(O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HIF1A Q16665 3/20 0.47
EPAS1 Q99814 1/20 0.47
APP P05067 6/20 0.45
CA12 O43570 3/20 0.43
CA1 P00915 3/20 0.43
CA2 P00918 3/20 0.43
CA7 P43166 3/20 0.43
CA9 Q16790 3/20 0.43
CA14 Q9ULX7 3/20 0.43
MAOB P27338 3/20 0.42
PTGS2 P35354 3/20 0.42
AKR1B1 P15121 2/20 0.42
AKR1B10 O60218 1/20 0.42
GLO1 Q04760 1/20 0.42
CAMK2A Q9UQM7 1/20 0.42
KDM4E B2RXH2 3/20 0.42
ALDH1A1 P00352 3/20 0.42
MAPT P10636 3/20 0.42
CA3 P07451 2/20 0.42
CA4 P22748 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6281994 0.79 CYP2C19 (0.48) MAOBMEN1CYP2C19KMT2ATDP1
SCHEMBL2789093 0.79 CYP2C19 (0.48) MAOBMEN1CYP2C19KMT2ATDP1
SCHEMBL2600069 0.79 APP (0.52) HIF1AEPAS1APPCA12CA1
SCHEMBL11032283 0.79 APP (0.52) HIF1AEPAS1APPCA12CA1
SCHEMBL11049215 0.73 CYP3A4 (0.48) HIF1AEPAS1APPCA12CA1
SCHEMBL29484744 0.73 HIF1A (0.53) HIF1AEPAS1APPCA12CA1
SCHEMBL26712918 0.73 TYR (0.59) HIF1AAPPCA12CA1CA2
SCHEMBL12883752 0.73 PTGS2 (0.54) APPMAOBPTGS2ALDH1A1MAPT
SCHEMBL16249924 0.72 NFKB1 (0.42) HIF1AEPAS1APPCA12CA1
SCHEMBL6693532 0.71 CA12 (0.52) HIF1AEPAS1APPCA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119827495-A Method for testing alkali purity, alkali strength and alkali residue by using photoetching machine 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed
CN-119827496-A Method for testing acid strength and acid production efficiency by using photoetching machine and application 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed