SCHEMBL31474486

SCHEMBL31474486

C=C(C)C(=O)OC(C)(C)CC.C=Cc1ccc(C(C)C)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 6/20 0.38
RAB9A P51151 4/20 0.38
NPC1 O15118 3/20 0.38
KDM4E B2RXH2 2/20 0.36
MAPK1 P28482 1/20 0.36
LMNA P02545 4/20 0.36
ALDH1A1 P00352 4/20 0.36
TYR P14679 1/20 0.35
POLB P06746 2/20 0.35
TAS1R3 Q7RTX0 2/20 0.34
TAS1R1 Q7RTX1 2/20 0.34
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
HTT P42858 1/20 0.33
HPGD P15428 4/20 0.32
CYP2D6 P10635 1/20 0.31
CYP2C9 P11712 1/20 0.31
HIF1A Q16665 1/20 0.31
GRIK1 P39086 1/20 0.31
GRIK2 Q13002 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31474461 0.90 TSHR (0.37) SMN1; SMN2RAB9ANPC1ALDH1A1TAS1R3
SCHEMBL31474509 0.85 CYP2C9 (0.35) SMN1; SMN2RAB9ALMNAALDH1A1TAS1R3
SCHEMBL31474455 0.85 NPC1 (0.35) SMN1; SMN2RAB9ANPC1LMNAALDH1A1
SCHEMBL31474462 0.84 SMN1; SMN2 (0.39) SMN1; SMN2RAB9ANPC1KDM4EMAPK1
SCHEMBL31474478 0.84 MAPT (0.34) SMN1; SMN2RAB9ANPC1KDM4ELMNA
SCHEMBL31474488 0.84 CYP1A2 (0.39) SMN1; SMN2RAB9ANPC1MAPK1LMNA
Styrene SCHEMBL31474472 0.84 ALDH1A1 (0.40) SMN1; SMN2RAB9ANPC1KDM4EMAPK1
SCHEMBL31474477 0.82 THRB (0.43) SMN1; SMN2RAB9ANPC1KDM4ELMNA
4-Vinylphenol SCHEMBL7135324 0.82 ESRRG (0.40) SMN1; SMN2RAB9ANPC1KDM4EMAPK1
SCHEMBL31474493 0.80 THRB (0.44) RAB9ANPC1ALDH1A1POLBMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119827495-A Method for testing alkali purity, alkali strength and alkali residue by using photoetching machine 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed
CN-119827496-A Method for testing acid strength and acid production efficiency by using photoetching machine and application 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed