SCHEMBL31474477

SCHEMBL31474477

C=C(C)C(=O)OC(C)(C)CC.C=Cc1ccc(CCC)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 9/20 0.43
THRA P10827 6/20 0.35
ALDH1A1 P00352 3/20 0.34
TAS1R3 Q7RTX0 1/20 0.34
TAS1R1 Q7RTX1 1/20 0.34
PPARA Q07869 2/20 0.33
PLK1 P53350 1/20 0.33
KMT2A Q03164 3/20 0.33
MAPT P10636 2/20 0.33
PLA2G1B P04054 1/20 0.33
ATG4B Q9Y4P1 1/20 0.33
MEN1 O00255 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
PPARG P37231 1/20 0.32
KDM4E B2RXH2 1/20 0.31
LMNA P02545 1/20 0.31
GAA P10253 1/20 0.31
HPGD P15428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31474493 0.93 THRB (0.44) THRBTHRAALDH1A1PPARAPLK1
SCHEMBL31474478 0.90 MAPT (0.34) THRBTHRAALDH1A1TAS1R3TAS1R1
SCHEMBL31474509 0.85 CYP2C9 (0.35) ALDH1A1TAS1R3TAS1R1PPARAKMT2A
SCHEMBL31474455 0.85 NPC1 (0.35) ALDH1A1TAS1R3TAS1R1KMT2AMEN1
SCHEMBL31474456 0.84 THRB (0.55) THRBTHRAALDH1A1TAS1R3TAS1R1
SCHEMBL31474488 0.84 CYP1A2 (0.39) ALDH1A1TAS1R3TAS1R1KMT2AMAPT
Styrene SCHEMBL31474472 0.84 ALDH1A1 (0.40) ALDH1A1PPARAKMT2AMAPTMEN1
SCHEMBL31474486 0.82 SMN1; SMN2 (0.38) ALDH1A1TAS1R3TAS1R1KMT2AMAPT
SCHEMBL31474461 0.80 TSHR (0.37) ALDH1A1TAS1R3TAS1R1KMT2AMAPT
SCHEMBL17527555 0.78 CYP4Z1 (0.37) THRBTHRAALDH1A1TAS1R3TAS1R1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119827495-A Method for testing alkali purity, alkali strength and alkali residue by using photoetching machine 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed
CN-119827496-A Method for testing acid strength and acid production efficiency by using photoetching machine and application 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed