Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADORA2A | P29274 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL314773 | 0.70 | ADORA2A (0.32) | ADORA2A | |
| SCHEMBL2007373 | 0.70 | ADORA2A (0.32) | ADORA2A | |
| SCHEMBL4385353 | 0.70 | ADORA2A (0.37) | ADORA2A | |
| SCHEMBL28188932 | 0.70 | ADORA2A (0.37) | ADORA2A | |
| SCHEMBL8082857 | 0.70 | ADORA2A (0.32) | ADORA2A | |
| SCHEMBL2007375 | 0.70 | ADORA2A (0.52) | ADORA2A | |
| SCHEMBL4386487 | 0.70 | ADORA2A (0.33) | ADORA2A | |
| SCHEMBL12533979 | 0.70 | — | — | |
| SCHEMBL321932 | 0.68 | ADORA2A (0.40) | ADORA2A | |
| SCHEMBL30361253 | 0.68 | ADORA2A (0.40) | ADORA2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 277 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119685022-A | Buffer oxide etching solution with high etching uniformity | 湖北兴福电子材料股份有限公司 | 2025-03-25 | — | — | CN | claimed |
| JP-11223937-A | — | — | None | — | — | JP | disclosed |
| US-20260140444-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-21 | — | — | US | disclosed |
| CN-122028714-A | Method for manufacturing semiconductor device and composition for coating patterned photoresist | 台湾积体电路制造股份有限公司 | 2026-05-12 | — | — | CN | disclosed |
| CN-119685022-B | Buffer oxide etching solution with high etching uniformity | 湖北兴福电子材料股份有限公司 | 2026-05-12 | — | — | CN | disclosed |
| US-20260130180-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-07 | — | — | US | disclosed |
| US-12607937-B2 | Photoresist top coating material for etching rate control | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-04-21 | — | — | US | disclosed |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-16 | — | — | US | disclosed |
| US-20260101726-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-09 | — | — | US | disclosed |
| US-12566374-B2 | Photoresist composition and method of manufacturing semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-03-03 | — | — | US | disclosed |
| WO-2005007718-A1 | POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-01-27 | — | — | WO | disclosed |
| WO-2005007719-A2 | POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-01-27 | — | — | WO | disclosed |
| US-20030087179-A1 | Positive photoresist transfer material and method for processing surface of substrate using the transfer material | FUJI PHOTO FILM CO., LTD. | 2003-05-08 | — | — | US | disclosed |
| JP-H11223937-A | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | FUJI FILM OLIN KK | 1999-08-17 | — | — | JP | disclosed |
| US-5350749-A | Fungicides, insecticides and miticides | DOWELANCO (US) | 1994-09-27 | — | — | US | disclosed |
| WO-1993017682-A1 | ANGIOTENSIN II RECEPTOR ANTAGONISTS | ABBOTT LABORATORIES (US) | 1993-09-16 | — | — | WO | disclosed |
| US-5034393-A | Fungicides for plants | DOWELANCO (US) | 1991-07-23 | — | — | US | disclosed |
| EP-0414386-A1 | Condensed pyrimidine derivates | DowElanco (US) | 1991-02-27 | — | — | EP | disclosed |
| EP-0380264-A2 | Halogenation process | DowElanco (US) | 1990-08-01 | — | — | EP | disclosed |
| US-4183934-A | NONALIURETIC DIURETICS | ABBOTT LABORATORIES (US) | 1980-01-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260140444-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | INO80C, INO80, NAT10 | ADORA2A 3128/4885 |
| US-12607937-B2 | Photoresist top coating material for etching rate control | ERCC1, ERCC2, RAD23B | ADORA2A 584/4885 |
| US-20260101726-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL | PIEZO1, MYB, MAP2K4 | ADORA2A 3139/4885 |
| US-12566374-B2 | Photoresist composition and method of manufacturing semiconductor device | INO80C, INO80, PI4K2B | ADORA2A 3397/4885 |
| US-20260130180-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION | C9, C1S, ZKSCAN2 | ADORA2A 2219/4885 |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | DSTN, PFAS, DNTT | ADORA2A 3730/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.