SCHEMBL3148557

SCHEMBL3148557

OCc1ccc(-c2ccccc2)cc1CO

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DCLRE1A Q6PJP8 1/20 0.47
DCLRE1B Q9H816 1/20 0.47
ALOX5 P09917 1/20 0.46
BACE1 P56817 2/20 0.46
CYP1A2 P05177 1/20 0.44
PDCD1 Q15116 1/20 0.44
CD274 Q9NZQ7 1/20 0.44
MMP3 P08254 1/20 0.42
BCL2L1 Q07817 1/20 0.42
ESR2 Q92731 3/20 0.42
ALDH1A1 P00352 2/20 0.42
ESR1 P03372 2/20 0.42
KDM4E B2RXH2 1/20 0.42
MEN1 O00255 1/20 0.42
USP2 O75604 1/20 0.42
LMNA P02545 1/20 0.42
HSP90AA1 P07900 1/20 0.42
GAA P10253 1/20 0.42
MAPT P10636 1/20 0.42
HPGD P15428 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31274531 0.93 HSD17B1 (0.46) DCLRE1ADCLRE1BALOX5BACE1CYP1A2
SCHEMBL2161220 0.88 GABRA1 (0.38) DCLRE1ADCLRE1BBACE1PDCD1CD274
SCHEMBL8188895 0.88 DPP4 (0.48) DCLRE1ADCLRE1BALOX5BACE1CYP1A2
SCHEMBL27604738 0.85 PTGS1 (0.57) DCLRE1ADCLRE1BMMP3LMNAGAA
SCHEMBL2096544 0.84 PDCD1 (0.47) DCLRE1ADCLRE1BALOX5BACE1CYP1A2
SCHEMBL9716759 0.83 BACE1 (0.61) DCLRE1ADCLRE1BALOX5BACE1CYP1A2
SCHEMBL29059236 0.83 ALOX5 (0.59) ALOX5BACE1CYP1A2MMP3BCL2L1
SCHEMBL8184843 0.82 TYR (0.46) ALOX5CYP1A2PDCD1CD274ALDH1A1
SCHEMBL3786738 0.81 HSD17B10 (0.52) DCLRE1ADCLRE1BALOX5BACE1CYP1A2
SCHEMBL18076562 0.81 BACE1 (0.46) DCLRE1ADCLRE1BALOX5BACE1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106008767-A Alcohol oxymethylene bridged bimetallic half-metallocene catalyst and preparation method and application 北京化工大学 2016-10-12 CN disclosed
US-8338078-B2 Photoresist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-12-25 US disclosed
US-20100104977-A1 PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-04-29 US disclosed