Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3167753 | 0.85 | ADORA2B (0.33) | ALDH1A1 | |
| SCHEMBL3167532 | 0.85 | ALDH1A1 (0.33) | ALDH1A1KDM4E | |
| SCHEMBL3158633 | 0.82 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL3149864 | 0.82 | ALDH1A1 (0.40) | ALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL3367198 | 0.81 | — | — | |
| SCHEMBL3164407 | 0.79 | TSHR (0.46) | ALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL3154773 | 0.78 | ALDH1A1 (0.37) | ALDH1A1KDM4E | |
| SCHEMBL3149373 | 0.78 | ALDH1A1 (0.37) | ALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL3159034 | 0.76 | TSHR (0.42) | ALDH1A1KDM4EHPGD | |
| SCHEMBL3150428 | 0.75 | MAPK1 (0.38) | ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| EP-1225480-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-03-17 | — | — | EP | disclosed |
| US-20070254247-A1 | Radiation-sensitive resin composition | YAMAMOTO MASAFUMI | 2007-11-01 | — | — | US | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7144675-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-12-05 | — | — | US | disclosed |
| US-7005230-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-02-28 | — | — | US | disclosed |
| US-6964840-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-15 | — | — | US | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| US-6838225-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-01-04 | — | — | US | disclosed |
| US-20040048192-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
| US-6623907-B2 | Chemical amplified photoresist | JSR CORPORATION (JP) | 2003-09-23 | — | — | US | disclosed |
| US-20020132181-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-09-19 | — | — | US | disclosed |
| EP-1225480-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-07-24 | — | — | EP | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |