SCHEMBL3156609

SCHEMBL3156609

C=COCCOCCOC(C)=O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.54
TSHR P16473 4/20 0.54
TP53 P04637 2/20 0.48
HIF1A Q16665 2/20 0.48
HSD17B10 Q99714 2/20 0.48
CHRM5 P08912 2/20 0.39
CHRM1 P11229 2/20 0.39
CHRM3 P20309 2/20 0.39
PGR P06401 1/20 0.39
CHRM2 P08172 1/20 0.39
CHRM4 P08173 1/20 0.39
HTR1A P08908 1/20 0.39
CHRNB2 P17787 1/20 0.39
TBXA2R P21731 1/20 0.39
CHRNB4 P30926 1/20 0.39
CHRNA3 P32297 1/20 0.39
CHRNA7 P36544 1/20 0.39
CHRNA4 P43681 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
CHRNA10 Q9GZZ6 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5196564 1.00 ALDH1A1 (0.54) ALDH1A1TSHRTP53HIF1AHSD17B10
SCHEMBL1128235 0.94
Acetic Acid SCHEMBL5944613 0.89 ALDH1A1 (0.45) ALDH1A1TSHRTP53HIF1AHSD17B10
Vinyl Ether SCHEMBL7155043 0.88 ALDH1A1 (0.43) ALDH1A1TSHRTP53HIF1AHSD17B10
SCHEMBL12256684 0.84 ALDH1A1 (0.41) ALDH1A1TSHRTP53HIF1AHSD17B10
SCHEMBL28941738 0.83 ALDH1A1 (0.41) ALDH1A1TSHRTP53HIF1AHSD17B10
SCHEMBL28616629 0.83 ALDH1A1 (0.41) ALDH1A1TSHRTP53HIF1AHSD17B10
SCHEMBL12805165 0.82 THRB (0.61) ALDH1A1TSHRTP53HIF1AHSD17B10
SCHEMBL36623 0.82 THRB (0.61) ALDH1A1TSHRTP53HIF1AHSD17B10
SCHEMBL2831369 0.82 THRB (0.61) ALDH1A1TSHRTP53HIF1AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8785582-B2 Vinylozy group-containing vinyl polymer NIPPON CARBIDE INDUSTRIES CO., LTD. (JP) 2014-07-22 US claimed
US-20130245189-A1 VINYLOZY GROUP-CONTAINING VINYL POLYMER NIPPON CARBIDE INDUSTRIES CO., INC. (JP) 2013-09-19 US claimed
US-20260002005-A1 DISULFUR DICHLORIDE AND ALKENYL ETHERS ADDITIVES FOR MOONEY JUMP GOODYEAR TIRE & RUBBER (US) 2026-01-01 US disclosed
CN-105319638-B Method for manufacturing polarizing plate 住友化学株式会社 2020-10-16 CN disclosed
US-9951166-B2 Fluorine-containing, silicon-containing polymer and surface treatment agent DAIKIN INDUSTRIES, LTD. (JP) 2018-04-24 US disclosed
US-9951166-B2 Fluorine-containing, silicon-containing polymer and surface treatment agent DAIKIN INDUSTRIES, LTD. (JP) 2018-04-24 US disclosed
US-9909027-B2 Surface treatment composition DAIKIN INDUSTRIES, LTD. (JP) 2018-03-06 US disclosed
US-9909027-B2 Surface treatment composition DAIKIN INDUSTRIES, LTD. (JP) 2018-03-06 US disclosed
US-20160291467-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 US disclosed
US-20160289488-A1 SURFACE TREATMENT COMPOSITION DAIKIN INDUSTRIES, LTD. (JP) 2016-10-06 US disclosed
US-20160291467-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 US disclosed
WO-2001085811-A2 COPOLYMERS FOR PHOTORESISTS AND PROCESSES THEREFOR E.I. DU PONT DE NEMOURS AND COMPANY (US) 2001-11-15 WO disclosed
WO-2001086352-A2 POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2001-11-15 WO disclosed
EP-1141777-A2 PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2001-10-10 EP disclosed
EP-1131677-A1 PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY E.I. DUPONT DE NEMOURS AND COMPANY (US) 2001-09-12 EP disclosed
WO-2001037047-A2 NITRILE/FLUOROALCOHOL POLYMER-CONTAINING PHOTORESISTS AND ASSOCIATED PROCESSES FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2001-05-25 WO disclosed
WO-2000067072-A1 FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2000-11-09 WO disclosed
WO-2000025178-A2 PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2000-05-04 WO disclosed
WO-2000017712-A1 PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2000-03-30 WO disclosed
US-5994025-A MIXTURE OF POLYMER AND ACID GENERATOR NEC CORPORATION (JP) 1999-11-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260002005-A1 DISULFUR DICHLORIDE AND ALKENYL ETHERS ADDITIVES FOR MOONEY JUMP MRE11, DDR1, DDB1 ALDH1A1 3672/4885TSHR 953/4885TP53 4144/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.